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Atomically Controlled Processing for Group IV Semiconductors

机译：IV族半导体的原子控制处理

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Junichi Murota; Masao Sakuraba;
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1. Atomically controlled CVD processing of group IV semiconductors for ultra-large-scale integrations - IOPscience [J] . Junichi Murota, Masao Sakuraba, Bernd Tillack Advances in Natural Sciences: Nanoscience and Nanotechnology . 2012,第2期

机译：用于超大规模集成的IV组半导体的原子控制CVD处理-IOPscience
2. Atomically Controlled Processing for Group IV Semiconductors by Chemical Vapor Deposition [J] . Junichi Murota, Masao Sakuraba, Bernd Tillack Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers . 2006,第9A期

机译：通过化学气相沉积对IV组半导体进行原子控制的处理
3. Atomically controlled processing for group IV semiconductors [J] . Murota J., Matsuura T., Sakuraba M. Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films . 2002,第1期

机译：IV族半导体的原子控制处理
4. Atomically controlled processing for nitrogen doping of group IV semiconductors [C] . Murota Junichi, Sakuraba Masao, Tillack Bernd IEEE International Conference on Solid-State and Integrated Circuit Technology . 2014

机译：IV族半导体氮掺杂的原子控制工艺
5. High-quality colloidal II-VI and IV-VI semiconductor nanowires: Diameter-controlled syntheses, quantum-confinement-effect studies, and electronic structure [D] . Sun, Jianwei 2008

机译：高质量胶体II-VI和IV-VI半导体纳米线：直径控制的合成，量子约束效应研究和电子结构
6. Initial Processes of Atomic Layer Deposition of Al2O3 on InGaAs: Interface Formation Mechanisms and Impact on Metal-Insulator-Semiconductor Device Performance [O] . Wipakorn Jevasuwan, Yuji Urabe, Tatsuro Maeda, 2012

机译：InGaAs上Al2O3原子层沉积的初始过程：界面形成机理及其对金属-绝缘体-半导体器件性能的影响
7. A Single Step Lapping and Polishing Process for Achieving Surfaces of Compound Semiconductors with Atomic Flatness using a Sub-micron Agglomerate-free Alumina Slurry [O] . Dutta, P.S., Rajagopalan, G., Gutmann, J.J., 2002

机译：使用亚微米无团聚氧化铝浆料实现具有原子平坦度的复合半导体表面的单步研磨和抛光工艺
8. Kinetic modeling of the atomic layer epitaxy window in group IV semiconductor growth [R] . Eres, G. 1995

机译：IV族半导体生长中原子层外延窗的动力学建模

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