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Effects of vapor CdCl2 treatment on the properties of CdS thin films prepared by R.F. magnetron sputtering

机译：蒸气CdCl2处理对R.F.制备的Cds薄膜性能的影响磁控溅射

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Liangmin Cai; Jian Huang; Jiawei Jiang; Jun Le;
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1. Effects of CdCl_2 treatment on the properties of CdS films prepared by r.f. magnetron sputtering [J] . Jae-Hyeong Lee, Dong-Jin Lee Thin Solid Films . 2007,第15期

机译：CdCl_2处理对r.f.制备的CdS薄膜性能的影响磁控溅射
2. Enhanced Structural and Photoelectric Properties of CdCl2 Coated CdS Thin Films Deposited by Magnetron Sputtering [J] . Li Jitao, Yang Dingyu, Zhu Xinghua, Nanoscience and Nanotechnology Letters . 2017,第9期

机译：通过磁控溅射沉积的CDCl2涂覆CDS薄膜的增强结构和光电性能
3. Radiation effects on dielectric properties of MIS structure with Si3N4 thin film prepared by r.f. magnetron sputtering [J] . Ertugrul R., Tataroglu A. Journal of optoelectronics and advanced materials . 2016,第9a10期

机译：射频对制备的Si3N4薄膜的辐射对MIS结构介电性能的影响磁控溅射
4. Effects of vapor CdCl_2 treatment on the properties of CdS thin films prepared by R.F. magnetron sputtering [C] . Liangmin Cai, Jian Huang, Jiawei Jiang, ICEESD 2011 . 2012

机译：蒸气CDCL_2治疗对R.F的CDS薄膜性能的影响。磁控溅射
5. Texture evolution in metal nitride (aluminum nitride, titanium nitride, hafnium nitride) thin films prepared by off-normal incidence reactive magnetron sputtering . [D] . Deniz, Derya. 2008

机译：非垂直入射反应磁控溅射制备的金属氮化物（氮化铝，氮化钛，氮化ha）薄膜的织构演变。
6. Processing and Study of Optical and Electrical Properties of (Mg Al) Co-Doped ZnO Thin Films Prepared by RF Magnetron Sputtering for Photovoltaic Application [O] . Chayma Abed, Susana Fernández, Selma Aouida, 2020

机译：射频磁控溅射制备（MgAl）共掺杂ZnO薄膜的光电性能研究与研究
7. Structural, chemical and optical characterizations of nanocrystallized AlN:Er thin films prepared by r.f. magnetron sputtering [O] . V. Brien, P. Miska, H. Rinnert, 2008

机译：纳米晶体的结构，化学和光学表征：R.F制备的薄膜薄膜。磁控溅射
8. Recrystallization of PVD CdTe Thin Films Induced by CdCl2 Treatment -- A Comparison Between Vapor and Solution Processes: Preprint [R] . Mountinho, H. R., Dhere, R. G., Romero, M. J., 2008

机译：CdCl2处理诱导pVD CdTe薄膜的再结晶 - 蒸汽与溶液过程的比较：预印

Effects of vapor CdCl2 treatment on the properties of CdS thin films prepared by R.F. magnetron sputtering

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