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Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition

机译：衬底在低压化学气相沉积法制备多晶硅薄膜生长过程中的作用

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L. Pereira; H. Águas; L. Raniero; R. M. S. Martins; E. Fortunato; R. Martins;
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机译：通过450℃的反应热化学气相沉积沉积和表征多晶硅薄膜
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6. Area Selective Growth of Titanium Diselenide ThinFilms into Micropatterned Substrates by Low-Pressure Chemical VaporDeposition [O] . Sophie L. Benjamin, C. H. (Kees) deGroot, Chitra Gurnani, -1

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7. Electrical properties of B-doped polycrystalline silicon thin films prepared by rapid thermal chemical vapour deposition [O] . Ai B, Shen H, Liang ZC, 2006

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Role of Substrate on the Growth Process of Polycrystalline Silicon Thin Films by Low-Pressure Chemical Vapour Deposition

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