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Influence of target-to-substrate distance on the properties of AZO films grown by RF magnetron sputtering

机译：靶 - 衬底距离对射频磁控溅射aZO薄膜性能的影响

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S. H. Jeong; J. H. Boo;
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年度 2013
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1. 室温条件下射频磁控溅射法制备AZO薄膜的结构与光电性能 [J] . 孙宜华, 王海林, 陈剑, 中国有色金属学报：英文版 . 2016,第006期
2. Influence of target-to-substrate distance on the properties of AZO films grown by RF magnetron sputtering [J] . S.H. Jeong, J.H. Boo Thin Solid Films . 2004,第Jan期

机译：靶到基片的距离对射频磁控溅射生长的AZO薄膜性能的影响
3. Effects of sputtering pressure and Al buffer layer thickness on properties of AZO films grown by rf magnetron sputtering [J] . Tseng C.H., Wang W.H., Chang H.C., Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology . 2010,第2期

机译：溅射压力和铝缓冲层厚度对射频磁控溅射生长AZO薄膜性能的影响
4. Effect of deposition temperature on the properties of nitrogen-doped AZO thin films grown on glass by rf reactive magnetron sputtering [J] . Shinho Cho, Heetae Kim Materials Science and Engineering . 2010,第3期

机译：沉积温度对射频反应磁控溅射在玻璃上生长氮掺杂AZO薄膜性能的影响
5. Effects of Growth Parameters on Surface-Morphological, Structural, Electrical and Optical Properties of AZO Films by RF Magnetron Sputtering [C] . Shou-Yi Kuo, Wei-Ting Lin, Liann-Be Chang Materials Research Society Symposium . 2010

机译：RF磁控溅射生长参数对偶氮膜表面形态学，结构，电气和光学性质的影响
6. Characterization of GaN thin films grown by RF Magnetron Sputtering for fabrication of an AlGaN/GaN HEMT biosensor [D] . Garza, Rocio Yolanda 2014

机译：射频磁控溅射生长的GaN薄膜的特性用于制造AlGaN / GaN HEMT生物传感器
7. Si-rich Al2O3 films grown by RF magnetron sputtering: structural and photoluminescence properties versus annealing treatment [O] . Nadiia Korsunska, Larysa Khomenkova, Oleksandr Kolomys, 2013

机译：通过射频磁控溅射生长的富硅Al2O3膜：结构和光致发光特性与退火处理的关系
8. Influence of Oxygen Flow Ratio on the Properties of In2O3Thin Films Grown by RF Reactive Magnetron Sputtering [O] . Jun-Ho Kwak, Shin-Ho Cho 2010

机译：氧气流量对RF反应磁控溅射生长的IN2O3膜膜性能的影响

Influence of target-to-substrate distance on the properties of AZO films grown by RF magnetron sputtering

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