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Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography

机译：用于极紫外微区域光刻的傅里叶合成定制相干照明器

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Patrick P. Naulleau; Kenneth A. Goldberg; Phil Batson; Jeffrey Bokor; Paul Denham; Senajith Rekawa;
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年度 2009
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1. Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography [J] . Patrick P. Naulleau, Kenneth A. Goldberg, Phil Batson, Applied optics . 2003,第5期

机译：傅立叶合成定制相干照明器，用于极紫外微场光刻
2. Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic [J] . Paul Denham, Eric Gullikson, Bruce Harteneck, Journal of Vacuum Science & Technology. B, Microelectronics Processing and Phenomena . 2002,第6期

机译：使用工程测试台架set-2光学元件在Advanced Light Source静态微场曝光站进行低于70 nm的极紫外光刻
3. Observation of Residual-Type Thin Absorber Defect on Extreme Ultraviolet Lithography Mask Using an Extreme Ultraviolet Microscope [J] . Tsuyoshi Amano, Susumu Iida, Ryoichi Hirano, _Applied Physics Express . 2013,第4期

机译：用极紫外显微镜观察极紫外光刻掩模上残留型薄吸收体缺陷
4. A Synchrotron-Based Fourier-Synthesis Custom-Coherence Illuminator [C] . Patrick P. Naulleau, Kenneth A. Goldberg, Phil Batson, International Conference on Synchrotron Radiation Instrumentation . 2004

机译：基于同步的傅立叶合成定制相干照明器
5. Intense capillary discharge plasma extreme-ultraviolet sources for extreme-ultraviolet lithography and other extreme-ultraviolet imaging applications. [D] . Klosner, Marc Alexander. 1998

机译：强烈的毛细管放电等离子体极紫外光源，用于极紫外光刻和其他极紫外成像应用。
6. Towards High Accuracy Reflectometry for Extreme-Ultraviolet Lithography [O] . Charles Tarrio, Steven Grantham, Matthew B. Squires, 2003

机译：迈向极紫外光刻的高精度反射计
7. Large-solid-angle illuminators for extreme ultraviolet lithography with laser plasmas [O] . Kubiak, G.D., Tichenor, D.A., Sweatt, W.C., 1995

机译：用于激光等离子体的极紫外光刻的大固体角度照明器

Fourier-synthesis custom-coherence illuminator for extreme ultraviolet microfield lithography

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