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Sidewall structure estimation from CD-SEM for lithographic process control

机译：从CD-SEM估算侧壁结构以进行光刻工艺控制

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Philip R. Bingham; Jeffery R. Price; Kenneth W. Tobin; Thomas P. Karnowski; Marylyn H Bennett; Hal Bogardus; Michael Bishop;
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年度 2009
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Sidewall structure estimation from CD-SEM for lithographic process control

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