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Approaching the numerical aperture of water - Immersion lithography at 193nm

机译：接近水的数值孔径-193nm的浸没式光刻

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Bruce W. Smith; Anatoly Bourov; Yongfa Fan; Lena Zavyalova; Neal Lafferty; Frank Cropanese;
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年度 2004
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1. Solid immersion optical lithography: index matching and resonant reflectors for large exposure field, high-aspect ratio imaging in the ultrahigh-numerical aperture regime [J] . Sam Lowrey, Richard Blaikie Journal of microanolithography, MEMS, and MOEMS . 2015,第4期

机译：固体浸没式光刻：用于大曝光场的折射率匹配和共振反射器，超高数值孔径条件下的高长宽比成像
2. Parametric source-mask-numerical aperture co-optimization for immersion lithography [J] . Xuejia Guo, Yanqiu Li, Lisong Dong, Journal of microanolithography, MEMS, and MOEMS . 2014,第4期

机译：用于浸没式光刻的参数化源-掩模-数值孔径共同优化
3. Solid-immersion Lloyd's mirror as a testbed for plasmon-enhanced ultrahigh numerical aperture lithography [J] . Prateek Mehrotra Charles W. Holzwarth and Richard J. Blaikie Journal of Micro/Nanolithography,MEMS,and MOEMS . 2011,第3期

机译：固体浸没劳埃德镜作为等离激元增强超高数值孔径光刻的试验台
4. Approaching the numerical aperture of water - Immersion lithography at 193nm [C] . Bruce W. Smith, Anatoly Bourov, Yongfa Fan, Conference on optical microlithography . 2004

机译：在193nm处接近水浸光刻的数值孔径
5. Characterizing polarized illumination in high numerical aperture optical lithography with phase shifting masks. [D] . McIntyre, Gregory Russell. 2006

机译：使用相移掩模在高数值孔径光刻中表征偏振照明。
6. Novel approach to endoscopic submucosal dissection of a cecal lesion with nonlifting sign by submucosal fatty tissue with use of selective-regulation high-pressure water-jet method and immersion in saline solution [O] . Felipe Ramos-Zabala, Sabina Beg, Marian García-Mayor, 2020

机译：选择性调节高压水喷射法浸入盐水溶液中通过粘膜下脂肪组织内窥镜检查盲肠病变黏膜下无抬起征的病变
7. Approaching the numerical aperture of water - Immersion lithography at 193nm [O] . Smith Bruce, Bourov Anatoly, Fan Yongfa 2004

机译：接近水的数值孔径 - 在193nm处的浸没式光刻
8. Evanescent Waves in High Numerical Aperture Aplanatic Solid Immersion Microscopy: Effects of Forbidden Light on Subsurface Imaging (Open Access, Publisher's Version). [R] . Yurt, A., Uyar, A., Cilingiroglu, T. B., 2014

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Approaching the numerical aperture of water - Immersion lithography at 193nm

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