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1 CD Variations Correction by Local Transmission Control of Photomasks Done with a Novel Laser based Process

机译：1 CD的变化校正，采用基于激光的新型工艺对光掩模进行局部透射控制

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Eitan Zait; Vladimir Dmitriev; Sergey Oshemkov; Guy Ben-zvi; Dany Michaelis;
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年度 2008
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1. Laser Process Proximity Correction for Improvement of Critical Dimension Linearity on a Photomask [J] . Jong Rak Park, Hyun Su Kim, Jin-Tae Kim, ETRI journal . 2005,第2期

机译：激光工艺接近度校正，用于改善光掩模上的临界尺寸线性
2. Laser Process Proximity Correction for Improvement of Critical Dimension Linearity on a Photomask [J] . Jong Rak Park, Hyun Su Kim, Jin-Tae Kim, ETRI journal . 2005,第2期

机译：激光工艺接近度校正，用于改善光掩模上的临界尺寸线性
3. Material Processing Using Femtosecond Lasers: Repairing Patterned Photomasks [J] . Richard Haight, Peter Longo, Alfred Wagner MRS bulletin . 2006,第8期

机译：使用飞秒激光进行材料处理：修复图案化的光掩模
4. CD Variations Correction by Local Transmission Control of Photomasks Done with a Novel Laser based Process [C] . Eitan Zait, Vladimir Dmitriev, Sergey Oshemkov, Metrology, Inspection, and Process Control for Microlithography XX pt.2 . 2006

机译：通过基于激光的新工艺完成的光掩模的局部透射控制来校正CD变化
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1 CD Variations Correction by Local Transmission Control of Photomasks Done with a Novel Laser based Process

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