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Optimal Phase Conflict Removal for Layout of Dark Field Alternating Phase Shifting Masks

机译：暗场交替相移掩模布局的最佳相冲突消除

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Piotr Berman; Andrew B. Kahng; Devendra Vidhani; Huijuan Wang; Alexander Zelikovsky;
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年度 1999
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1. Optimal phase conflict removal for layout of dark field alternating phase shifting masks [J] . Berman P., Kahng A.B. IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems . 2000,第2期

机译：用于暗场交替相移掩模布局的最佳相位冲突消除
2. Investigation of Optimum Biasing and Undercut for Single Trench Alternating Phase Shift Mask in 193 nm Lithography [J] . JI-EUN LEE, HYE-YOUNG KANG, DONG-SOO SHIN, Japanese Journal of Applied Physics. Part 1, Regular Papers, Brief Communications & Review Papers . 2006,第11期

机译：193 nm平版印刷中单沟槽交替相移掩模的最佳偏置和底切研究
3. Application of an Alternating Phase-Shifting Mask Design Method to Near-Field Photolithography for Fabricating More Than 2 GHz SAW Devices [J] . Fu-Der Lai, Jui-Ming Hua, Hao-Min Huang IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control . 2007,第10期

机译：交替相移掩模设计方法在制造2 GHz以上声表面波器件的近场光刻中的应用
4. Optimal phase conflict removal for layout of dark field alternating phase shifting masks [C] . Piotr Berman, Andrew B. Kahng, Devendra Vidhani, International symposium on Physical design . 1999

机译：用于暗场交替相移掩模布局的最佳相位冲突消除
5. Generalized inverse lithography methods for phase-shifting mask design. [D] . Ma, Xu. 2007

机译：用于相移掩模设计的广义逆光刻方法。
6. High energy X-ray phase and dark-field imaging using a random absorption mask [O] . Hongchang Wang, Yogesh Kashyap, Biao Cai, -1

机译：使用随机吸收掩模的高能X射线相位和暗场成像
7. New graph bipartizations for double-exposure, bright field alternating phase-shift mask layout [O] . Andrew B. Kahng, Shailesh Vaya, Er Zelikovsky 2013

机译：用于双重曝光，明场交替相移掩模版图的新图形二等分
8. Characterization of an LCD for Use as a Programmable Phase Shifter to Produce aSingle-Lobed Far-Field Pattern in a Phased Array [R] . Kenyon, G. S. 1993

机译：用作可编程移相器的LCD的表征，用于在相控阵中产生单独的远场模式

Optimal Phase Conflict Removal for Layout of Dark Field Alternating Phase Shifting Masks

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