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Optical Thin-Film Decomposition for DUV Positive Tone Resist Process Monitoring

机译：用于DUV正色调抗蚀剂过程监控的光学薄膜分解

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Xinhui Niu; Nickhil Jakatdar; Costas Spanos; Joe Bendik; Ron Kovacs;
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年度 2007
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1. Positive-tone resist for supercritical CO_2 processing [J] . Victor Q. Pham, Peter T. Nguyen, Gina L. Weibel, Polymer Preprints . 2002,第2期

机译：用于超临界CO_2处理的正性抗蚀剂
2. Deprotection kinetic monitoring of a 193 nm positive tone resist by ellipsometry [J] . H. Ridaoui, J.H. Tortai, S. Derrough, Microelectronic Engineering . 2008,第5a6期

机译：椭偏仪监测193 nm正性光刻胶的脱保护动力学
3. UV impact on the optical properties of thin films of positive tone chemically amplified resist [J] . J.H. Tortai, H. Trouve, S. Soulan, Microelectronic Engineering . 2009,第4a6期

机译：紫外线对正型化学放大抗蚀剂薄膜的光学性能的影响
4. Optical thin-film decomposition for DUV positive-tone resist process monitoring [C] . Xinhui Niu, Univ. of California/Berkeley, Berkeley, Conference on metrology, inspection, and process control for microlithography . 1998

机译：用于DUV正性抗蚀剂工艺监控的光学薄膜分解
5. Lexical tone processing by monolingual and bilingual speakers of tone and non-tone languages. [D] . Danielson, Donald Kyle. 2012

机译：语音和非语音语言的单语和双语说话者的词汇音调处理。
6. Thin Film of Amorphous Zinc Hydroxide Semiconductor for Optical Devices with an Energy-Efficient Beneficial Coating by Metal Organic Decomposition Process [O] . Makoto Karakawa, Tohru Sugahara, Yukiko Hirose, -1

机译：通过金属有机分解工艺在具有光能效涂层的光学器件中使用非晶态氢氧化锌半导体薄膜
7. The Development of Chemically Amplified Positive- and Negative-tone Resists for DUV Lithography. [O] . James W. Thackeray, Timothy Adams, Michael F. Cronin, 1994

机译：DUV光刻化学放大的抗蚀剂抗蚀剂的发展。
8. Aminodisilanes as silylating agents for dry-developed positive-tone resists for extreme ultraviolet (13.5) microlithography [R] . Wheeler, D. , Kubiak, G. , Henderson, C. , 1996

机译：氨基二硅烷作为甲硅烷基化剂，用于干法显影的正极性抗蚀剂，用于极紫外（13.5）微光刻

Optical Thin-Film Decomposition for DUV Positive Tone Resist Process Monitoring

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