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Simulation of Sub-Halfmicron Mask Defect Printability at 1X Reticle Magnification

机译：亚半微米掩模缺陷在1X掩模版放大倍数下的可印刷性模拟

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Warren W. Flack;
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年度 1997
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1. Simulation Analysis of the Characteristics of a High Magnification Imaging Optics for the Observation of Extreme Ultraviolet Lithography Mask to Predict Phase Defect Printability [J] . Tsuneo Terasawa, Yukiyasu Arisawa, Tsuyoshi Amano, Japanese journal of applied physics . 2013,第9issue1期

机译：用于观察极紫外光刻掩模以预测相缺陷可印刷性的高倍成像光学元件特性的模拟分析
2. Evaluating printability of buried native extreme ultraviolet mask phase defects through a modeling and simulation approach [J] . Mihir Upadhyaya, Vibhu Jindal, Adarsh Basavalingappa, Journal of microanolithography, MEMS, and MOEMS . 2015,第2期

机译：通过建模和仿真方法评估掩埋的原生极紫外掩膜相缺陷的可印刷性
3. Detection, Repair and Printability of Reticle Defects [J] . Khoi Phan, Christopher Spence, John Riddick, Semiconductor International . 2001,第10期

机译：十字线缺陷的检测，修复和可印刷性
4. Simulation of subhalfmicron-mask defect printability at 1X reticle magnification [C] . Warren W. Flack, Ultratech Stepper, Inc., Metrology, Inspection, and Process Control for Microlithography XI . 1997

机译：亚半微米掩模缺陷在1X掩模版放大倍数下的可印刷性仿真
5. Local area mask patterning of extreme ultraviolet lithography reticles for native defect analysis [D] . Lyons, Adam 2013

机译：用于自然缺陷分析的极紫外光刻掩模版的局部掩模图案
6. Raw nuclear magnetic resonance data of human linker histone H1x lacking the C-terminal domain (NGH1x) and trajectory data of nanosecond molecular dynamics simulations of GH1x- and NGH1x-chromatosomes [O] . Herna de Wit, Alicia Vallet, Bernhard Brutscher, 2020

机译：人体连接组组蛋白H1x的原始核磁共振数据缺乏C-末端域（NGH1x）以及GH1X和NGH1x-Chromatosomes的纳秒分子动力学模拟的轨迹数据
7. Investigation of buried EUV mask defect printability using actinic inspection and fast simulation [O] . Clifford, C. H., Chan, T. T., Neureuther, A. R., 2009

机译：利用光化学检测和快速模拟研究埋藏EUV掩模缺陷的可印刷性

Simulation of Sub-Halfmicron Mask Defect Printability at 1X Reticle Magnification

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