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Numerical simulation of particle deposition in duct air flows with uniform, expanding or contracting cross-section

机译:截面均匀,膨胀或收缩的管道气流中颗粒沉积的数值模拟

摘要

Particle deposition in two-dimensional turbulent duct air flows with uniform, expanding or contracting cross-section was studied by CFD simulation. The Reynolds stress turbulent model (RSM) with UDF correction and discrete particle model (DPM) were adopted to predict air flow fields and particle deposition rate. After numerical validation of air velocity profiles and particle deposition velocity in uniform duct, the air flow field structures, flow drag and particle deposition behaviors in expanding and contracting ducts with different air velocities and particle sizes were investigated and compared with uniform duct case. It was found that particle deposition velocity is overall reduced in expanding duct while enhanced in contracting duct. However, the modification magnitude of deposition velocity is significant discrepant for different particle sizes due to the role of near-wall turbulent eddies. For expanding duct cases, the particle deposition velocities are reduced about one or two orders of magnitude for large particles (dp3μm) but less than 5 times for small particles (dp3μm), compared with uniform duct cases. For contracting duct cases, the particle deposition velocities are increased less than 7 times for large particles while about 20–60 times for small particles. Besides, the deposition mechanisms of particles in expanding and contracting duct were also studied and discussed.
机译:通过CFD模拟研究了具有均匀,膨胀或收缩横截面的二维湍流导管气流中的颗粒沉积。采用具有UDF校正的雷诺应力湍流模型(RSM)和离散颗粒模型(DPM)来预测空气流场和颗粒沉积速率。在对均匀风道中的风速分布和颗粒沉积速度进行数值验证后,研究了不同风速和粒径的膨胀和收缩风道中的气流场结构,流动阻力和颗粒沉积行为,并将其与均匀风道情况进行了比较。发现在膨胀管中颗粒沉积速度总体上降低了,而在收缩管中颗粒沉积速度提高了。然而,由于近壁湍流涡流的作用,沉积速度的改变幅度对于不同的颗粒大小是明显不同的。对于膨胀管情况,与均匀管情况相比,大颗粒(dp <3μm)的颗粒沉积速度降低约一到两个数量级,而小颗粒(dp <3μm)的颗粒沉积速度降低不到5倍。对于风管收缩情况,大颗粒的颗粒沉积速度增加不到7倍,而小颗粒的颗粒沉积速度大约增加20-60倍。此外,还研究和讨论了颗粒在伸缩管道中的沉积机理。

著录项

  • 作者

    Lu H; Lu L; Jiang Y;

  • 作者单位
  • 年度 2016
  • 总页数
  • 原文格式 PDF
  • 正文语种 eng
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