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The effect of waveform for pulse plating on copper plating distribution of microvia in PCB manufacture

机译:脉冲电镀波形对PCB制造中微孔铜镀层分布的影响

摘要

The application of microvias is to reduce the size and weight of the printed circuit board, and to enhance its electrical performance. In many instances, the plating of microvias creates a bottleneck for High Density Interconnection (HDI) manufacture. In this study, the effects of waveform on the copper plating process were investigated. The results showed that the addition of a spike, and a decrease in forward current can improve the throwing power in plating quality. The study also found that the combination of multiple spikes, a low forward current and a high reverse current can significantly improve copper distribution in microvias plating.
机译:微孔的应用是为了减小印刷电路板的尺寸和重量,并增强其电性能。在许多情况下,微孔镀层会成为高密度互连(HDI)制造的瓶颈。在这项研究中,研究了波形对镀铜过程的影响。结果表明,增加尖峰和减小正向电流可以改善镀覆质量的投射能力。研究还发现,多个尖峰,低正向电流和高反向电流的组合可以显着改善微孔电镀中的铜分布。

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