首页> 外文OA文献 >Controlled performance of an organic transistor memory device with an ultrathin LiF blocking layer
【2h】

Controlled performance of an organic transistor memory device with an ultrathin LiF blocking layer

机译:具有超薄LiF阻挡层的有机晶体管存储器件的受控性能

摘要

In this paper, the controlled performance of a novel organic pentacene transistor memory device with an ultrathin LiF blocking layer was investigated. Our results demonstrate the introduction of an ultrathin LiF layer has a significant influence on the transistor memory performance. As the LiF thickness increased from 0 to 3 nm, the charge carrier mobility showed a three-fold increase from 0.15 to 0.43 cm2 V-1 s-1 due to hole injection enhancement. Moreover, the on/off current ratio increased from 5 to 50 at long measurement times. This significant enhancement of charge retention behavior (∼10 times improvement) was ascribed to the LiF blocking effect when the trapped charge was released from silver nanoparticle induced trap centers. However, the memory window showed a slight decrease from 60 to 37 V, which is due to the decreased penetration depth of silver nanoparticles into the pentacene layer. The physical origin of the memory effect with the LiF ultrathin layer was also discussed. Our introduction of an ultrathin LiF layer offers a simple and feasible way to control the different memory performances of this novel transistor memory device.
机译:在本文中,研究了具有超薄LiF阻挡层的新型有机并五苯晶体管存储器件的控制性能。我们的结果表明,引入超薄LiF层对晶体管的存储性能具有重大影响。当LiF厚度从0增大到3 nm时,由于空穴注入增强,电荷载流子迁移率从0.15到0.43 cm2 V-1 s-1增长了三倍。此外,长时间测量时,开/关电流比从5增加到50。当捕获的电荷从银纳米颗粒诱导的陷阱中心释放时,这种电荷保留行为的显着增强(提高了约10倍)归因于LiF阻断作用。但是,存储窗口显示从60 V降至37 V略有下降,这是由于银纳米颗粒进入并五苯层的渗透深度降低所致。还讨论了LiF超薄层的记忆效应的物理起源。我们对超薄LiF层的介绍提供了一种简单可行的方法来控制这种新型晶体管存储设备的不同存储性能。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号