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Micro-pressure sensors made of indium tin oxide thin films

机译:铟锡氧化物薄膜制成的微压传感器

摘要

The microstructure, electrical resistivity and piezoresistive property of magnetron sputtered indium tin oxide (ITO) films were investigated as functions of preparation and post-annealing conditions. Annealing at 400 °C for 30 min resulted in low electrical resistivity ≤6.0 × 10-3 Ω cm and observable piezoresistive coefficient ranging from -4.3 × 10-11 to -7.1 × 10-11 Pa-1. Prototypes of pressure sensors with an annealed ITO film deposited on a 25 μm thick silicon diaphragm were fabricated. With a bias voltage of 1 V, the device gave a voltage response of 12.6 mV when the differential pressure across the diaphragm varied from -6 × 104 to 6 × 104 Pa.
机译:研究了磁控溅射铟锡氧化物(ITO)薄膜的微观结构,电阻率和压阻特性,作为制备和后退火条件的函数。在400°C下退火30分钟导致电阻率≤6.0×10-3Ωcm,并且可观察到的压阻系数为-4.3×10-11至-7.1×10-11 Pa-1。制作了在25微米厚的硅膜片上沉积有ITO退火膜的压力传感器的原型。在1 V的偏置电压下,当隔膜两端的压差从-6×104到6×104 Pa变化时,该器件的电压响应为12.6 mV。

著录项

  • 作者

    Yeung KW; Ong CW;

  • 作者单位
  • 年度 2007
  • 总页数
  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类

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