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Low power flexible organic thin film transistors with amorphous Ba0.7Sr0.3TiO3 gate dielectric grown by pulsed laser deposition at low temperature

机译:低温下通过脉冲激光沉积生长具有非晶Ba0.7Sr0.3TiO3栅极电介质的低功率柔性有机薄膜晶体管

摘要

We deposited amorphous Ba0.7Sr0.3TiO3 (BST) on silicon and plastic substrate under 110 degrees C by pulsed laser deposition (PLD) and use it as the dielectric of the organic transistor. Depends on the thickness of BST layer, the highest mobility of the devices can achieve 1.24 cm(2) V (1) s (1) and 1.01 cm(2) V (1) s (1) on the silicon and polyethylene naphthalate (PEN) substrate, respectively. We also studied the upward and downward bending tests on the transistors and the dielectric thin films. We found that the BST dielectric pentacene transistor can maintain the mobility at 0.5 cm(2) V (1) s (1) or higher while the bending radius is around 3 mm in both upward and downward bending. Our finding demonstrates the potential application of PLD growth high-k dielectric in the large area organic electronics devices.
机译:我们通过脉冲激光沉积(PLD)在110摄氏度下在硅和塑料基板上沉积了非晶Ba0.7Sr0.3TiO3(BST),并将其用作有机晶体管的电介质。取决于BST层的厚度,器件的最高迁移率可以在硅和聚萘二甲酸乙二醇酯(1)上达到1.24 cm(2)V(1)s(1)和1.01 cm(2)V(1)s(1)( PEN)基板。我们还研究了晶体管和介电薄膜的向上和向下弯曲测试。我们发现BST电介质并五苯晶体管可以将迁移率保持在0.5 cm(2)V(1)s(1)或更高,而向上和向下弯曲的弯曲半径均为3 mm左右。我们的发现证明了PLD生长高k电介质在大面积有机电子设备中的潜在应用。

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