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The Effect of Copper on the Defect Structure of Cadmium Telluride Thin-Film Solar Cells

机译:铜对碲化镉薄膜太阳能电池缺陷结构的影响

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摘要

Transient photocapacitance (TPC) and transient photocurrent (TPI) spectroscopy have been used to examine the defect structure in the upper-half of the bandgap of CdTe solar cells, with an emphasis on understanding the effect of copper. TPC spectra reveal two defects in the CdTe devices at optical energies of 1.2eV and 0.9eV with respect to the valence band. The origin of the 1.2eV defect could not be associated with a particular element, although copper and zinc were ruled out as sources. TPI spectra were used to observe that the density of the 1.2eV defect was dramatically reduced by thermally annealing the devices, suggesting that the defect itself is annealed during the treatment.The set of CdTe samples examined used a rapid thermal processing treatment to control the amount of copper that diffused into the CdTe layer from the Cu:ZnTe interfacial layer at the back of the device. Comparison of devices with varying amounts of copper in the CdTe layer revealed that the 0.9eV defect seen in TPC was associated with the presence of copper in the absorber layer. TPI spectra confirmed the association of the 0.9eV with copper and showed that the magnitude of the 0.9eV defect signal increased as more copper was diffused into the CdTe layer. A proportional link between the density of the 0.9eV defect observed in TPI spectra and the amount of copper in the absorber layer observed via ToF-SIMS further established that copper is responsible for the existence of the defect. Numerical modeling of the CdTe devices was used to confirm that the spatial distribution of copper observed in ToF-SIMS was consistent with the relative variation of defect magnitudes observed in TPI.The fact that the copper-associated 0.9eV defect lies close to mid-gap suggests that it will act as an efficient recombination center in CdTe. Therefore, it is suggested that this work has detected the deep defect that is responsible for the decreased minority carrier lifetime that has been previously associated with the amount of copper in the CdTe layer
机译:瞬态光电容(TPC)和瞬态光电流(TPI)光谱已用于检查CdTe太阳能电池带隙上半部的缺陷结构,重点是了解铜的作用。 TPC光谱显示在CdTe器件中,相对于价带,在1.2eV和0.9eV的光能下存在两个缺陷。尽管排除了铜和锌作为来源,但1.2eV缺陷的起源与特定元素无关。使用TPI光谱观察到,通过对器件进行热退火可以显着降低1.2eV缺陷的密度,这表明缺陷本身在处理过程中已经退火。所检查的CdTe样品集使用快速热处理来控制含量铜从器件背面的Cu:ZnTe界面层扩散到CdTe层中。比较CdTe层中铜含量不同的器件,发现TPC中出现的0.9eV缺陷与吸收层中铜的存在有关。 TPI光谱证实了0.9eV与铜的缔合,并且表明0.9eV缺陷信号的幅度随着更多的铜扩散到CdTe层中而增加。在TPI光谱中观察到的0.9eV缺陷的密度与通过ToF-SIMS观察到的吸收层中铜的量之间的比例关系进一步确定,铜是造成缺陷存在的原因。使用CdTe器件的数值模型来确认,ToF-SIMS中观察到的铜的空间分布与TPI中观察到的缺陷量的相对变化一致。与铜相关的0.9eV缺陷接近于中间间隙。建议它将作为CdTe中的高效重组中心。因此,建议这项工作已检测出深层缺陷,该缺陷是先前与CdTe层中铜含量有关的少数载流子寿命缩短的原因

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    Warren Charles;

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  • 年度 2016
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