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Aberration induced intensity imbalance of alternating phase shifting mask in lithographic imaging

机译：光刻成像中像差引起的交替相移掩模的强度不平衡

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Peng B(彭勃); Wang XZ(王向朝); Qiu ZC(邱自成); Yuan QY(袁琼雁); Cao YT(曹宇婷);
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1. Aberration-induced intensity imbalance of alternating phase-shifting mask in lithographic imaging [J] . Bo Peng, Xiangzhao Wang, Zicheng Qiu, Optics Letters . 2010,第9期

机译：光刻成像中像差引起的交替相移掩模的强度不平衡
2. Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in alternating phase-shifting mask image [J] . Bo Peng, Xiangzhao Wang, Zicheng Qiu, Applied optics . 2010,第15期

机译：基于交替相移掩模图像中相邻峰的强度差的光刻投影光学器件的均匀像差测量
3. Translational-symmetry alternating phase shifting mask grating mark used in a linear measurement model of lithographic projection lens aberrations [J] . Zicheng Qiu, Xiangzhao Wang, Qunyu Bi, Applied optics . 2009,第19期

机译：平移对称交替移相掩模光栅标记在光刻投影像差线性测量模型中的应用
4. Image imbalance compensation in alternating Phase-Shift Masks towards the 45 nm node through-pitch imaging [C] . Lieve Van Look, Bryan Kasprowicz, Axel Zibold, Annual BACUS Symposium on Photomask Technology . 2005

机译：图像不平衡补偿在交替相移掩模朝向45nm节点通斜体成像
5. Measuring aberrations in lithographic projection systems with phase wheel targets. [D] . Zavyalova, Lena. 2010

机译：使用相位轮靶测量光刻投影系统中的像差。
6. Phase-Shift Targeted Nanoparticles for Ultrasound Molecular Imaging by Low Intensity Focused Ultrasound Irradiation Corrigendum [O] . 2020

机译：相移靶向纳米颗粒用于通过低强度聚焦超声辐射进行超声分子成像勘误
7. Even aberration measurement of lithographic projection optics based on intensity difference of adjacent peaks in an alternating phase shifting mask image [O] . Peng B(彭勃), Wang XZ(王向朝), Qiu ZC(邱自成), 2010

机译：基于交替相移掩模图像中相邻峰的强度差的光刻投影光学器件的均匀像差测量

Aberration induced intensity imbalance of alternating phase shifting mask in lithographic imaging

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