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Damage threshold influenced by the high absorption defect at the film–substrate interface under ultraviolet laser irradiation

机译：紫外激光辐照下膜-基底界面高吸收缺陷对损伤阈值的影响

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于振坤; Hongbo He; Wei Sun; Hongji Qi; Minghong Yang; Qiling Xiao; Meiping Zhu;
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1. Damage threshold influenced by the high absorption defect at the film-substrate interface under ultraviolet laser irradiation [J] . Zhenkun Yu, Hongbo He, Wei Sun, Optics Letters . 2013,第21期

机译：紫外激光照射下膜-膜界面高吸收缺陷对损伤阈值的影响
2. Role of HfO_2/SiO_2 thin-film interfaces in near-ultraviolet absorption and pulsed laser damage [J] . Semyon Papernov, Alexei A. Kozlov, James B. Oliver, Optical engineering . 2017,第1期

机译：HFO_2 / SiO_2薄膜界面在近紫外线吸收和脉冲激光损伤中的作用
3. Influence of different substrates on laser induced damage thresholds at 1064 nm of Ta2O5 films [J] . Xu C, Ma JY, Jin YX, Chinese physics letters . 2008,第4期

机译：不同衬底对Ta2O5薄膜在1064 nm处激光诱导的损伤阈值的影响
4. Interface absorption versus film absorption in HfO_2/SiO_2 thin-film pairs in the near-ultraviolet and the relation to pulsed-laser damage [C] . S. Papernov, A. A. Kozlov, J. B. Oliver Annual laser damage symposium . 2014

机译：HfO_2 / SiO_2薄膜对中近紫外的界面吸收与膜吸收的关系及其与脉冲激光损伤的关系
5. Laser induced damage in thin films and their substrates. [D] . Rowley, David Michael. 1972

机译：激光引起的薄膜及其基材损伤。
6. ZnO films grown by pulsed-laser deposition on soda lime glass substrates for the ultraviolet inactivation of Staphylococcus epidermidis biofilms [O] . Jean-Paul Mosnier, Richard J O’Haire, Enda McGlynn, 2020

机译：在钠钙玻璃基板上通过脉冲激光沉积生长的ZnO膜，用于表皮葡萄球菌生物膜的紫外线灭活
7. Radiation damage to amorphous carbon thin films irradiated by multiple 46.9 nm laser shots below the single-shot damage threshold [O] . L. Juha, V. Hájková, J. Chalupský, 2009

机译：由多个46.9 nm激光射击照射的无定形碳薄膜损伤的辐射损伤在单次损伤阈值以下

Damage threshold influenced by the high absorption defect at the film–substrate interface under ultraviolet laser irradiation

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