ETUDE DES MOYENS DE LITHOGRAPHIE HAUTE RESOLUTION POUR LA FABRICATION DE RESONATEURS A ONDES ELASTIQUES DE SURFACE : APPLICATION AUX SOURCES EMBARQUEES

摘要

The purpose of this thesis is to study high-resolution lithography for the fabrication of surface acoustic wave resonators, and to illustrate this technology through the realization of frequency sources operating beyond the Gigahertz. At first, we detail several devices based on surface acoustic waves and frequency sources (instability characteristics) and set the goals of the study in particular through a state of the art. In a second step, we present the lithography methods studied in this work : electron beam lithography, focused ion beam, UV lithography (stepper) and nano-imprint lithography. For each, we detail the operating principle and show, in particular through simulations, their interest and limitations. Then, we present the fabrication and characterization of resonators on different types of substrates with innovative properties compared to our applications. The epitaxial PZT exhibits high coupling coefficients (several percent) coupled with a fine particle size and crystal orientation along the axis 001. The diamond, which achieves phase velocities of about 10000 m.s-1, twice higher than those of STW waves on quartz substrate, quartz that we have also studied in order to search new operating points at high frequency. For each material, we identify one or more lithography methods that allow to manufacture the resonators. Design, fabrication and characterization steps are described in detail. The last part of the manuscript describes the characteristics of oscillators based on high Qf resonators (Qf > 5.1012). We report the results for operating frequencies of 1.5 GHz (on quartz) and 3 GHz (on nanocrystalline diamond). The phase noise at 10 kHz from the carrier is between -100 and -110 dBc.Hz-1, and the noise floor is -160 dBc.Hz-1. We conclude by giving ideas to improve these characteristics.