首页> 外文OA文献 >Optical and structural analysis of solar selective absorbing coatings based on AlSiOx:W cermets
【2h】

Optical and structural analysis of solar selective absorbing coatings based on AlSiOx:W cermets

机译:基于AlSiOx:W金属陶瓷的太阳选择性吸收涂层的光学和结构分析

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

It is reported in this work the development and study of the optical and structural properties of a solar selective absorber cermet based on AlSiOx:W. A four-layer composite film structure, W/AlSiOx:W(HA)/AlSiOx:W(LA)/AlSiOx, was deposited on stainless steel substrates using the magnetron sputtering deposition method. Numerical calculations were performed to simulate the spectral properties of multilayer stacks with varying metal volume fraction cermets and film thickness. The chemical analysis was performed using X-ray photoelectron spectroscopy and the results show that in the high metal volume fraction cermet layer, AlSiOx:W(HA), about one third of W atoms are in the W-O oxidation state, another third in the Wx+ oxidation state and the last third in the W4+, W5+ and W6+ oxidation states. The X-ray diffractograms of AlSiOx:W layers show a broad peak indicating that both, W and AlSiOx, are amorphous. These results indicate that this film structure has a good spectral selective property that is suitable for solar thermal applications, with the coatings exhibiting a solar absorptance of 94-95.5% and emissivities of 8-9% (at 100 degrees C) and 10-14% (at 400 degrees C). The samples were subjected to a thermal annealing at 450 degrees C, in air, and 580 degrees C, in vacuum and showed very good oxidation resistance and thermal stability. Morphological characterizations were carried out using scanning electron microscopy and atomic force microscopy. Rutherford Backscattering experiments were also performed to analyze the tungsten depth profile.
机译:这项工作报道了基于AlSiOx:W的太阳能选择性吸收金属陶瓷的光学和结构特性的开发和研究。使用磁控溅射沉积法将四层复合膜结构W / AlSiOx:W(HA)/ AlSiOx:W(LA)/ AlSiOx沉积在不锈钢基板上。进行数值计算以模拟具有变化的金属体积分数金属陶瓷和膜厚度的多层堆叠的光谱特性。化学分析是使用X射线光电子能谱进行的,结果表明,在高金属体积分数的金属陶瓷层AlSiOx:W(HA)中,大约三分之一的W原子处于WO氧化态,另外三分之一处于Wx +氧化态,最后四分之一处于W4 +,W5 +和W6 +氧化态。 AlSiOx:W层的X射线衍射图显示一个宽峰,表明W和AlSiOx均为非晶态。这些结果表明,该膜结构具有良好的光谱选择性能,适用于太阳热应用,该涂层的太阳吸收率为94-95.5%,发射率为8-9%(在100摄氏度下)和10-14 %(在400摄氏度下)。样品在空气中于450摄氏度和真空中于580摄氏度进行热退火,并表现出非常好的抗氧化性和热稳定性。使用扫描电子显微镜和原子力显微镜进行形态表征。还进行了卢瑟福反向散射实验,以分析钨的深度分布。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号