A transparent vanadium oxide film has been one of the most studied electrochromic (EC) and Thermochromic (TC) materials. Vanadium oxide filmswere deposited at different substrate temperatures up to 400 °Cand different ratios of the oxygen partial pressure (PO2). SEM,AFMand X-ray diffraction'sresults show detail structure data of the films. IR mode assignments of the films measured by IR reflection–absorbance in NGIA (near grazing incidenceangle) are given. It is found that the film has V2O5 and VO2 combined structures. The films exhibit clear changes in transmittance when the environmenttemperature (Te) is varied, especially in the 3600–4000 cm−1 range. Applying a Te that is higher than a critical temperature (Tc) to the samples, the as-RT(room temperature) deposited film with 9% PO2 has a transmittance variation of 30%, but the films that were deposited on a heated substrate of 400 °Chave little variation. There is tendency of bigger variation in transmittance for the sample deposited at a larger PO2, when it is applied by 200 °C Te.
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机译：透明的氧化钒薄膜一直是研究最多的电致变色（EC）和热致变色（TC）材料之一。在高达400°C的不同基板温度和不同比例的氧分压（PO2）下沉积氧化钒膜。 SEM，AFM和X射线衍射结果显示了薄膜的详细结构数据。给出了通过NGIA（近掠入射角）中的IR反射吸收率测量的薄膜的IR模式分配。发现该膜具有V 2 O 5和VO 2的组合结构。当环境温度（Te）变化时，尤其是在3600–4000 cm-1范围内，薄膜的透射率会发生明显变化。将高于临界温度（Tc）的Te应用于样品，PO2含量为9％的as-RT（室温）沉积膜的透射率变化为30％，但是沉积在加热衬底上的膜的透射率变化为30％。 400°Chave几乎没有变化。当在200°C Te下施加时，在较大的PO2下沉积的样品的透射率会有较大变化的趋势。
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