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A new, low-cost, PDMS metallization process for highly conductive flexible and stretchable electronics

机译:一种新型,低成本,PDMS金属化工艺,用于高度导电的柔性和可拉伸电子产品

摘要

This thesis describes a novel microfabrication process to produce thick-film copper microstructures that are embedded in polydimethylsiloxane (PDMS). This process has reduced fabrication complexity and cost compared to existing techniques, and enables rapid prototyping of designs using minimal microfabrication equipment. This technology differs from others in its use of a conductive copper paint seed layer and a unique infrared-assisted transfer process. The resulting microstructures are embedded flush with the PDMS surface, rather than on top, and adhere to PDMS without the need of surface modifications. The 70-micrometers-thick copper layer has a surface roughness of approximately 5 micrometers, a low film resistivity of 2.5-3 micro-Ohm-cm, and can be patterned with feature sizes of 100 micrometers. The low-cost, thick metal films demonstrate a comparative advantage in high-current, low-power applications, with feature sizes and metal layer properties that are otherwise comparable to similar processes. Several applications are fabricated, including stretchable interconnects integrated with fabrics for wearable devices and a multi-layer electromagnetic microactuator with a soft magnetic nanocomposite polymer core for large magnetic field generation. The interconnects can accommodate strains of 57 percent before conductive failure, which is similar to existing technology, and demonstrate a significantly lower resistance of less than 0.5 Ohm per device. The actuator produces an average magnetic field of 2.5 milli-Tesla per volt applied within a cylindrical volume of 34 cubic millimeters. Simulations indicate that fields of up to 1 Tesla are possible for 200 micro-second input pulses, and that significantly larger fields are achievable through simple design modifications. These results are comparable to existing devices, while our device has the advantage of being fully flexible, low-cost, and is easily integrated with various substrates and polymer microfabrication processes.
机译:本文描述了一种新型的微细加工工艺,该工艺可生产嵌入聚二甲基硅氧烷(PDMS)中的厚膜铜微结构。与现有技术相比,该工艺降低了制造复杂性和成本,并且能够使用最少的微制造设备对设计进行快速原型制作。这项技术与其他技术的不同之处在于使用了导电的铜漆种子层和独特的红外辅助转印工艺。所得的微结构与PDMS表面齐平嵌入,而不是在顶部嵌入,并且无需表面修饰即可粘附到PDMS。厚度为70微米的铜层的表面粗糙度约为5微米,低膜电阻率为2.5-3微米欧姆-厘米,可以以100微米的特征尺寸进行图案化。低成本,厚金属膜在高电流,低功率应用中显示出比较优势,其特征尺寸和金属层特性可与类似工艺媲美。加工了多种应用,包括与可穿戴设备的织物集成的可拉伸互连件,以及具有用于产生大磁场的软磁性纳米复合聚合物核的多层电磁微致动器。与现有技术类似,该互连可以在发生导电故障之前承受57%的应变,并且每个电阻的电阻明显低于0.5欧姆。在34立方毫米的圆柱体体积内,执行器产生的平均磁场强度为每伏2.5毫特斯拉。仿真表明,对于200微秒的输入脉冲,最多可以有1特斯拉的磁场,并且通过简单的设计修改就可以实现更大的磁场。这些结果可与现有设备相媲美,而我们的设备具有完全灵活,低成本的优点,并且易于与各种基板和聚合物微细加工工艺集成。

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  • 作者

    Hilbich Daniel David;

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  • 年度 2017
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