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Magnetic properties of Fe films and Fe/Si/fe trilayers grown on GaAs(001) and MgO(001) by ion-beam sputter epitaxy

机译:在GaAs(001)和MgO(001)上通过离子束溅射外延生长的Fe膜和Fe / Si / fe三层膜的磁性

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摘要

We grow monocrystalline Fe(001) films and Fe/Si/Fe(001) trilayers by ion-beam sputter epitaxy on GaAs(001) and MgO(001) substrates. Ion-beam sputtering parameters such as substrate presputtering time, substrate temperature, beam voltage, and target angle are optimized for 10-nm-thick Fe(001) films with respect to epitaxial growth and magnetic properties. In situ low-energy electron diffraction patterns confirm the epitaxial and monocrystalline nature of the sputtered films, surprisingly even on untreated and thus oxidized substrates. The magneto-optical Kerr effect and ferromagnetic resonance are employed to investigate the magnetic properties, and the structural properties are characterized by atomic force microscopy and x-ray reflectivity measurements. Using the optimized set of parameters that yields the best magnetic properties for single Fe films on GaAs, we deposit epitaxial Fe/Si/Fe(001) structures and observe antiferromagnetic interlayer exchange coupling for epitaxially sputtered Fe/Si/Fe(001) trilayers on GaAs(001). The total coupling strength reaches values of up to 2 mJ/m(2) at a Si thickness of 15 angstrom. (C) 2006 American Institute of Physics.
机译:我们通过在GaAs(001)和MgO(001)衬底上进行离子束溅射外延生长单晶Fe(001)膜和Fe / Si / Fe(001)三层膜。对于10nm厚的Fe(001)薄膜,在外延生长和磁性方面,对离子束溅射参数(例如衬底预溅射时间,衬底温度,束电压和目标角度)进行了优化。原位低能电子衍射图谱证实了溅射薄膜的外延和单晶性质,甚至在未经处理并因此被氧化的基材上也令人惊讶。利用磁光克尔效应和铁磁共振来研究磁性能,并通过原子力显微镜和X射线反射率测量来表征结构性能。使用对GaAs上的单个Fe膜产生最佳磁性能的优化参数集,我们沉积外延Fe / Si / Fe(001)结构并观察外延溅射Fe / Si / Fe(001)三层的反铁磁层间交换耦合GaAs(001)。 Si厚度为15埃时,总耦合强度达到2 mJ / m(2)。 (C)2006美国物理研究所。

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