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Novel Chemical Vapor Deposition Process of ZnO Thin Films using Nonequilibrium Plasma Generated near Atmospheric Pressure

机译：在大气压附近产生非平衡等离子体的ZnO薄膜化学气相沉积新工艺

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学位記番号：論工第1431号, 指導教員：藤村　紀文

机译：学位编号：Ronko No. 1431，主管：Kimura Fujimura

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野瀨幸則;
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年度 2016
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1. Novel chemical vapor deposition process of ZnO films using nonequilibrium N_2 plasma generated near atmospheric pressure with small amount of O_2below 1% [J] . Yukinori Nose, Takeshi Yoshimura, Atsushi Ashida, Journal of Applied Physics . 2016,第17期

机译：ZnO薄膜的化学气相沉积新工艺，该工艺使用非平衡N_2等离子体在大气压下产生，少量O_2低于1％
2. Atmospheric-pressure plasma-enhanced chemical vapor deposition of electrochromic organonickel oxide thin films with an atmospheric pressure plasma jet [J] . Yung-Sen Lin, Di-Jiun Lin, Ping-Ju Sung, Thin Solid Films . 2013,第apra1期

机译：大气压等离子体射流在大气压等离子体下增强电致变色有机镍氧化物薄膜的化学气相沉积
3. Study of plasma enhanced chemical vapor deposition of ZnO films by non-thermal plasma jet at atmospheric pressure [J] . Yosuke Ito, Osamu Sakai, Kunihide Tachibana Thin Solid Films . 2010,第13期

机译：大气压下非热等离子体射流对ZnO薄膜进行等离子体增强化学气相沉积的研究
4. Effects of plasma power and deposition pressure on the properties of the low dielectric constant plasma polymerized cyclohexane thin films deposited by plasma enhanced chemical vapor deposition [C] . C. Shim, J. Yang, Y.C. Quan, European conference on chemical vapor deposition . 2001

机译：等离子体功率和沉积压力对等离子体增强化学气相沉积沉积的低介电常数等离子体聚合环己烷薄膜的影响
5. Experimental investigation of atmospheric pressure nonequilibrium plasma chemistry for plasma assisted chemical vapor deposition (PACVD) of diamond thin films [D] . Baldwin, Scott Keith, Jr. 1996

机译：大气压非平衡等离子体化学处理金刚石薄膜的等离子体辅助化学气相沉积（PACVD）的实验研究
6. Atmospheric Pressure Plasma Chemical Vapor Deposition of Carvacrol Thin Films on Stainless Steel to Reduce the Formation of E. Coli and S. Aureus Biofilms [O] . Tsegaye Gashaw Getnet, Gabriela F. da Silva, Iolanda S. Duarte, 2020

机译：不锈钢上碳酸薄膜的大气压等离子体化学气相沉积减少了大肠杆菌和金黄色葡萄球菌的形成
7. High-Rate Deposition of Amorphous Silicon Thin Films by Atmospheric Pressure Plasma Chemical Vapor Deposition. (1st Report). Design and Production of the Atmospheric Pressure Plasma CVD Apparatus with Rotary Electrode. [O] . Yuzo MORI, Kumayasu YOSHII, Kiyoshi YASUTAKE, 1999

机译：大气压等离子体化学气相沉积的非晶硅薄膜的高速率沉积。（第一个报告）。具有旋转电极的大气压等离子体CVD装置的设计与生产。
8. Atmospheric Pressure Chemical Vapor Deposition and Jet Vapor Deposition of CdTe for High Efficiency Thin Film PV Devices [R] . Woods, L., Meyers, P. 2002

机译：高效薄膜光伏器件的常压化学气相沉积和CdTe的气相沉积

Novel Chemical Vapor Deposition Process of ZnO Thin Films using Nonequilibrium Plasma Generated near Atmospheric Pressure

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