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Correlation of tellurium inclusions and carrier lifetime in detector grade cadmium zinc telluride

机译:探测器级碲化镉锌中碲夹杂物和载流子寿命的相关性

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摘要

Carrier lifetimes and telluriuminclusion densities in detector grade cadmiumzinc telluride crystals grown by the high pressure Bridgman method were optically measured using pulsed laser microwavecavity perturbation and infrared microscopy. Excess carriers were produced in the material using a pulsed laser with a wavelength of 1064 nm and pulse width of 7 ns, and the electronic decay was measured at room temperature. Spatial mapping of lifetimes and defect densities in cadmiumzinc telluride was performed to determine the relationship between telluriumdefect density and trapping. A strong correlation was found between the volume fraction of telluriuminclusions and the carrier trapping time.
机译:使用脉冲激光微波腔扰动和红外显微镜对通过高压布里奇曼法生长的检测器级碲锌镉锌晶体中的载流子寿命和碲中包含的​​密度进行了光学测量。使用波长为1064 nm,脉冲宽度为7 ns的脉冲激光在材料中产生了多余的载流子,并在室温下测量了电子衰减。对碲化镉锌的寿命和缺陷密度进行空间映射,以确定碲缺陷密度与俘获之间的关系。发现碲包裹体的体积分数与载流子捕获时间之间存在很强的相关性。

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