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Temperature dependence of defect-related photoluminescence in III-V and II-VI semiconductors

机译:III-V和II-VI半导体中与缺陷相关的光致发光的温度依赖性

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摘要

Mechanisms of thermal quenching of photoluminescence (PL) related to defects insemiconductors are analyzed. We conclude that the Schön-Klasens (multi-center) mechanism of the thermal quenching of PL is much more common for defects in III–V and II–VI semiconductorsas compared to the Seitz-Mott (one-center) mechanism. The temperature dependencies of PLare simulated with a phenomenological model. In its simplest version, three types of defects are included: a shallow donor, an acceptor responsible for the PL, and a nonradiative center that has the highest recombination efficiency. The case of abrupt and tunable thermal quenching ofPL is considered in more detail. This phenomenon is predicted to occur in high-resistivitysemiconductors. It is caused by a sudden redirection of the recombination flow from a radiative acceptor to a nonradiative defect.
机译:分析了与缺陷半导体有关的光致发光(PL)的热猝灭机理。我们得出结论,与Seitz-Mott(单中心)机制相比,PL热淬灭的Schön-Klasens(多中心)机制在III-V和II-VI半导体中的缺陷上更为常见。用现象学模型模拟了PL的温度依赖性。在其最简单的版本中,包括三种类型的缺陷:浅的供体,负责PL的受体和重组效率最高的非辐射中心。更详细地考虑了PL突然可调热淬火的情况。预计这种现象会在高电阻率半导体中发生。这是由于重组流突然从辐射受体重定向到非辐射缺陷而引起的。

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    Reshchikov Michael A.;

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