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Temperature dependence of defect-related photoluminescence in III-V and II-VI semiconductors

机译:III-V和II-VI半导体中与缺陷相关的光致发光的温度依赖性

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摘要

Mechanisms of thermal quenching of photoluminescence (PL) related to defects in semiconductors are analyzed. We conclude that the Schön-Klasens (multi-center) mechanism of the thermal quenching of PL is much more common for defects in III–V and II–VI semiconductors as compared to the Seitz-Mott (one-center) mechanism. The temperature dependencies of PL are simulated with a phenomenological model. In its simplest version, three types of defects are included: a shallow donor, an acceptor responsible for the PL, and a nonradiative center that has the highest recombination efficiency. The case of abrupt and tunable thermal quenching of PL is considered in more detail. This phenomenon is predicted to occur in high-resistivity semiconductors. It is caused by a sudden redirection of the recombination flow from a radiative acceptor to a nonradiative defect.
机译:分析了与半导体缺陷相关的光致发光(PL)的热淬灭机理。我们得出的结论是,与Seitz-Mott(单中心)机制相比,PL热淬灭的Schön-Klasens(多中心)机制对于III-V和II-VI半导体中的缺陷更为普遍。 PL的温度依赖性通过现象模型进行模拟。在其最简单的版本中,包括三种类型的缺陷:浅的供体,负责PL的受体和重组效率最高的非辐射中心。更详细地考虑了PL突然可调热淬火的情况。预计这种现象会在高电阻率半导体中发生。这是由于重组流突然从辐射受体重定向到非辐射缺陷而引起的。

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    Reshchikov Michael A.;

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