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Development of high-performance lead-free piezoelectric thin films and nanostructures for microelectronic devices

机译:开发用于微电子器件的高性能无铅压电薄膜和纳米结构

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摘要

In this thesis, high-performance lead-free piezoelectric epitaxial thin films and nanostructures based on (1-x)Ba(Zr0.2Ti0.8)O3-x(Ba0.7Ca0.3)TiO3 (BZT-xBCT) and (Bi0.5Na0.5)TiO3-BaTiO3 (BNBT) were prepared using pulsed laser deposition (PLD) and laser molecular beam epitaxy (LMBE). Firstly, by investigating the effects of deposition temperature and oxygen partial pressure on the physical properties of BZT-0.5BCT thin films, the optimal deposition temperature and oxygen partial pressure were determined to be 850 ˚C and 200 mTorr, respectively. A series of BZT-xBCT homogenous thin films were then prepared under the optimized conditions to study the compositional dependence of structural and electrical properties. A morphology phase boundary (MPB)-like behaviour was observed at the composition of x=0.5 with a high remanent polarization Pr of 17.8 μC/cm2 and a large piezoelectric coefficient d33 of 100 ± 5 pm/V. The compositional gradient BZT-xBCT multilayers were fabricated. A higher remanent polarization and a larger piezoelectric coefficient were attained in compositionally downgraded (DG) thin films compared to the compositionally upgraded (UG) one, owing to the retained in-plane compressive strain and large built-in electric field, respectively. The origin of the internal electric field was also confirmed to be the flexoelectric effect. The morphology engineering was extended to BCTm/BZTm (m presents the number of unit cells for BCT and BZT in one period) symmetric superlattices prepared by LMBE. The growth rate was precisely controlled with the aid of reflection high-energy electron diffraction (RHEED). A built-in electric field was observed in all superlattices and its strength was periodicity dependent, i.e. the longer the periodicity, the larger the built-in electric field. An excellent piezoelectric coefficient was obtained in BCT3/BZT3 superlattice with d33+ of 150 ± 5 pm/V.Finally, Mn doped BNBT (MnBNBT) thin film was fabricated with a high Pr of 33.0 μC/cm2 and a large d33 of 120.0 ± 20 pm/V. By changing the deposition temperature, the defect level was finely tuned and minimized in the MnBNBT thin film deposited at 700˚C, giving rise to the excellent ferroelectric and piezoelectric properties. In summary, the high-performance lead-free piezoelectric thin films and nanostructures fabricated in this work presented their promising prospect on substituting lead-based materials as well as potential on applications of piezoelectric microelectronic devices.
机译:本文基于(1-x)Ba(Zr0.2Ti0.8)O3-x(Ba0.7Ca0.3)TiO3(BZT-xBCT)和(Bi0)的高性能无铅压电外延薄膜和纳米结构使用脉冲激光沉积(PLD)和激光分子束外延(LMBE)制备.5Na0.5)TiO3-BaTiO3(BNBT)。首先,通过研究沉积温度和氧分压对BZT-0.5BCT薄膜物理性能的影响,确定最佳沉积温度和氧分压分别为850˚C和200 mTorr。然后在优化的条件下制备了一系列的BZT-xBCT均匀薄膜,以研究结构和电性能的成分依赖性。在x = 0.5的成分下观察到类似形态边界(MPB)的行为,具有17.8μC/ cm2的高剩余极化Pr和100±5 pm / V的大压电系数d33。制备了成分梯度BZT-xBCT多层膜。与成分升级的(UG)薄膜相比,成分降低的(DG)薄膜具有更高的剩余极化率和更大的压电系数,这分别归因于保留的面内压缩应变和较大的内置电场。内部电场的起源也被证实是柔电效应。形态学工程扩展到了LMBE制备的BCTm / BZTm(m表示一个时期BCT和BZT的晶胞数量)对称超晶格。借助反射高能电子衍射(RHEED)精确控制了生长速率。在所有超晶格中都观察到一个内置电场,其强度与周期有关,即,周期越长,内置电场就越大。在BCT3 / BZT3超晶格中获得了出色的压电系数,d33 +为150±5 pm / V。最后制成了Mn掺杂的BNBT(MnBNBT)薄膜,其高Pr为33.0μC/ cm2,大d33为120.0±20 pm / V。通过改变沉积温度,可以在700°C沉积的MnBNBT薄膜中对缺陷水平进行微调和最小化,从而具有出色的铁电和压电性能。总之,在这项工作中制造的高性能无铅压电薄膜和纳米结构在替代铅基材料方面具有广阔的前景,并在压电微电子器件的应用方面具有潜力。

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