首页> 外文OA文献 >The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering

【2h】

The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering

机译：化学浴沉积和脉冲直流磁控溅射沉积CdS的结构性能

代理获取

本网站仅为用户提供外文OA文献查询和代理获取服务，本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文，但由于OA文献来源多样且变更频繁，仍可能出现获取不到、文献不完整或与标题不符等情况，如果获取不到我们将提供退款服务。请知悉。

页面导航

摘要
著录项
引文网络
相似文献
相关主题

摘要

This is an open access article under the CC BY licenseud(http://creativecommons.org/licenses/by/3.0/)

机译：这是CC BY许可下的开放获取文章 ud（http://creativecommons.org/licenses/by/3.0/）

著录项

作者
Lisco Fabiana; Kaminski Piotr M.; Abbas Ali; Bass Kevin; Bowers Jake W.; Claudio Gianfranco; Losurdo Maria; Walls Michael;
展开▼
作者单位

展开▼
年度 2015
总页数
原文格式 PDF
正文语种 en
中图分类

相似文献

外文文献
中文文献
专利

1. The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering [J] . Lisco F., Kaminski P. M., Abbas A., Thin Solid Films . 2015,第maya1期

机译：化学浴沉积和脉冲直流磁控溅射沉积CdS的结构特性
2. Effect of moving speed during in-line pulsed direct-current magnetron sputtering deposition on the structural and optical properties of Al-doped ZnO films [J] . Kim Sung Yong, Cho Eou-Sik, Kwon Sang Jik Thin Solid Films . 2017,第sepa30期

机译：在线脉冲直流磁控溅射沉积过程中的移动速度对掺Al ZnO薄膜的结构和光学性能的影响
3. Effect of deposition power on structural and electrical properties of Al-doped ZnO films using pulsed direct-current magnetron sputtering with single cylindrical target [J] . Shin BK, Lee TI, Kar JP, Materials science in semiconductor processing . 2011,第1期

机译：单圆柱靶脉冲直流磁控溅射沉积功率对掺铝ZnO薄膜结构和电性能的影响
4. Electrodeposition of CdTe films on CdS layers deposited using magnetron sputtering and chemical bath deposition [C] . F. Lisco, A. Abbas, J. W. Bowers, Photovoltaic Science, Applications and Technology Conference . 2014

机译：使用磁控溅射和化学浴沉积沉积CDS层上CDTE膜的电沉积
5. Tribological and structural properties of titanium nitride and titanium aluminum nitride coatings deposited with modulated pulsed power magnetron sputtering [D] . Ward, Logan 2014

机译：调制脉冲功率磁控溅射沉积氮化钛和氮化铝钛涂层的摩擦学和结构性能
6. The Influence of AlN Intermediate Layer on the Structural and Chemical Properties of SiC Thin Films Produced by High-Power Impulse Magnetron Sputtering [O] . Nierlly Galvão, Marciel Guerino, Tiago Campos, 2016

机译：AlN中间层对大功率脉冲磁控溅射SiC薄膜结构和化学性能的影响
7. The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering [O] . Lisco F., Kaminski P.M., Abbas A., 2015

机译：化学浴沉积和脉冲直流磁控溅射沉积CdS的结构性能

The structural properties of CdS deposited by chemical bath deposition and pulsed direct current magnetron sputtering

摘要

著录项

引文网络

相似文献

相关主题

期刊订阅