Direct-write techniques for maskless production of microelectronics: a review of current state-of-the-art technologies

摘要

This is a conference paper [© IEEE]. It is also available from: http://dx.doi.org/10.1109/ICEPT.2009.5270702. Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work in other works must be obtained from the IEEE.