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Abrasive Particles Trajectory Analysis and Simulation of Cluster Magnetorheological Effect Plane Polishing

机译：团簇磁流变效应平面抛光的磨料颗粒轨迹分析与模拟

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Pan Jisheng; Yan Qiusheng; Xu Xipeng; Zhu Jiangting; Wu Zhancheng; Bai Zhenwei;
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年度 2012
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1. Analysis of Motion Trajectory and Dwell Time of Abrasive in Magnetorheological Finishing with Tiny-grinding Wheel Cluster [J] . Jingfu Chai, Qiusheng Yan, Jiabin Lu, Key Engineering Materials . 2010,第期

机译：细磨轮簇磁流变精加工中磨料的运动轨迹和停留时间分析
2. Material removal mechanism of cluster magnetorheological effect in plane polishing [J] . Pan Jisheng, Yan Qiusheng The International Journal of Advanced Manufacturing Technology . 2015,第9a12期

机译：平面抛光团簇磁流变效应的材料去除机理
3. Coarse-grained molecular dynamics simulations of particle behaviors in magnetorheological polishing fluid [J] . Xu Jinhuan, Li Jianyong, Zhu Pengzhe, Computational Materials Science . 2019,第期

机译：磁流变抛光液中颗粒行为的粗粒分子动力学模拟
4. Study on Plane Magnetic Abrasive Finishing Process - Experimental and Theoretical Analysis on Polishing Trajectory [C] . Yanhua Zou, Anyuan Jiao, Toshio Aizawa International Symposium on Advances in Abrasive Technology . 2010

机译：平面磁磨削整理过程研究 - 抛光轨迹的实验与理论分析
5. Abrasive Particle Trajectories and Material Removal Non-Uniformity during CMP and Filtration Characteristics of CMP Slurries - A Simulation and Experimental Study. [D] . Rastegar, Vahid. 2017

机译：CMP过程中的磨料颗粒轨迹和材料去除不均匀性以及CMP浆料的过滤特性-模拟和实验研究。
6. Cluster Analysis of Molecular Simulation Trajectories for Systems where Both Conformation and Orientation of the Sampled States are Important [O] . Tigran M. Abramyan, James A. Snyder, Aby A. Thyparambil, -1

机译：分子构象和取向都很重要的系统分子模拟轨迹的聚类分析
7. Optimization of Single-Sided Lapping Kinematics Based on Statistical Analysis of Abrasive Particles Trajectories [O] . Adam Barylski, Norbert Piotrowski 2017

机译：基于磨料粒子轨迹统计分析的单面研磨运动学优化

Abrasive Particles Trajectory Analysis and Simulation of Cluster Magnetorheological Effect Plane Polishing

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