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Damage-free and Atomically-flat Finishing of Single Crystal SiC by Combination of Oxidation and Soft Abrasive Polishing

机译：氧化与软磨料抛光相结合的单晶SiC无损和原子平坦表面处理

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Deng Hui; Endo Katsuyoshi; Yamamura Kazuya;
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年度 2014
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1. Damage-free and Atomically-flat Finishing of Single Crystal SiC by Combination of Oxidation and Soft Abrasive Polishing [J] . Hui Deng, Katsuyoshi Endo, Kazuya Yamamura Procedia CIRP . 2014,第5期

机译：氧化与软磨料抛光相结合的单晶SiC的无损和原子平坦抛光
2. Atomic-scale finishing of carbon face of single crystal SiC by combination of thermal oxidation pretreatment and slurry polishing [J] . Hui Deng, Nian Liu, Katsuyoshi Endo, Applied Surface Science . 2018,第MARa15期

机译：热氧化预处理与浆料抛光相结合的单晶SiC碳面原子级精加工
3. Atomic-scale planarization of 4H-SiC (0001) by combination of thermal oxidation and abrasive polishing [J] . Deng, Hui, Endo, Applied Physics Letters . 2013,第11期

机译：热氧化和磨料抛光相结合的4H-SiC（0001）原子级平面化
4. Damage-free and atomically-flat finishing of single crystal SiC by combination of oxidation and soft abrasive polishing [C] . Hui Deng, Katsuyoshi Endo, Kazuya Yamamura CIRP Conference on Surface Integrity . 2014

机译：通过氧化和软磨料抛光的组合，单晶SiC的无损坏和原子平整的原子平面
5. Mandrel-based Polishing of Single-Crystal Diamond and Ceramics for Fabrication of Micro-endmills: Analysis of the Polishing Characteristics and the Error Motions of Ultra-High-Speed Micromachining Spindles. [D] . Anandan, Krishna Prashanth. 2012

机译：用于微立铣刀制造的单晶金刚石和陶瓷的基于心轴的抛光：超高速微加工主轴的抛光特性和误差运动分析。
6. Combination of Plasma Electrolytic Processing and Mechanical Polishing for Single-Crystal 4H-SiC [O] . Gaoling Ma, Shujuan Li, Xu Liu, 2021

机译：单晶4H-SIC等血浆电解处理和机械抛光的组合
7. Investigation of SiC Single Crystal Polishing by Combination of Anodic Oxidation and Mechanical Polishing [O] . Xincheng Yin 2020

机译：通过阳极氧化和机械抛光组合研究SiC单晶抛光

Damage-free and Atomically-flat Finishing of Single Crystal SiC by Combination of Oxidation and Soft Abrasive Polishing

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