首页> 外文OA文献 >The Improved Self-assembled Monolayer of Octadecyltrichlorosilane as Positive Resist for Patterning Silicon Surface by Metastable Helium Atom Beam Lithography

【2h】

The Improved Self-assembled Monolayer of Octadecyltrichlorosilane as Positive Resist for Patterning Silicon Surface by Metastable Helium Atom Beam Lithography

机译：改进的十八烷基三氯硅烷自组装单分子膜作为正阻层，用于亚稳氦原子束光刻

代理获取

本网站仅为用户提供外文OA文献查询和代理获取服务，本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文，但由于OA文献来源多样且变更频繁，仍可能出现获取不到、文献不完整或与标题不符等情况，如果获取不到我们将提供退款服务。请知悉。

页面导航

著录项
引文网络
相似文献
相关主题

著录项

作者
Wang Z.P.; Kurahashi M.; Suzuki T.; Sun X.; Zhang Z.M.; Ding Z.J.; Yamauchi Y.;
展开▼
作者单位

展开▼
年度 2012
总页数
原文格式 PDF
正文语种
中图分类

相似文献

外文文献
中文文献
专利

1. Selective functionalization of silicon surface controlled by metastable helium atom beam for patterning chemisorbed monolayer molecular assemblies [J] . Wang Z. P., Zhang J. W., Zhang Z. M., Surface and Interface Analysis: SIA: An International Journal Devoted to the Development and Application of Techniques for the Analysis of Surfaces, Interfaces and Thin Films . 2014,第12a13期

机译：受亚稳氦原子束控制的硅表面选择性官能化，用于构图化学吸附的单分子分子组件
2. Patterning of gold film on muscovite mica by using a helium-metastable atom beam and an octanethiol self-assembled monolayer [J] . X. Ju, M. Kurahashi, T. Suzuki, Journal of Vacuum Science & Technology. B, Microelectronics and Nanometer Structure . 2003,第6期

机译：利用氦可转移原子束和辛硫醇自组装单分子层在白云母云母上构图金膜
3. Characterization of nanoscale patterns prepared by metastable helium atom beam and butanethiol self-assembled monolayers [J] . Xin Ju, Mitsunori Kurahashi, Taku Suzuki, Thin Solid Films . 2003,第Aug期

机译：亚稳氦原子束和丁硫醇自组装单层制备的纳米级图案的表征
4. Metastable helium beam lithography by using alkanethiolates self-assembled monolayers as resists [C] . JU Xin, KURAHASHI M, SUZUKI T, China-Japan Joint Seminar on Atomic Level Characterization . 2006

机译：通过使用链烷醇酸酯自组装单层作为抗蚀剂，稳定氦梁光刻
5. UV photopatterning, electron beam lithography and site-specific surface reactions of alkanethiolate self-assembled monolayers adsorbed on gold and gallium arsenide (001). [D] . Zhou, Chuanzhen. 2009

机译：吸附在金和砷化镓（001）上的链烷硫醇盐自组装单层的紫外光图案化，电子束光刻和特定位置的表面反应。
6. Trehalose Glycopolymer Resists Allow Direct Writing of Protein Patterns by Electron-Beam Lithography [O] . Erhan Bat, Juneyoung Lee, Uland Y. Lau, -1

机译：海藻糖糖醇抗性可通过电子束光刻直接写入蛋白质图案
7. mr-PosEBR: a novel positive tone resist for high resolution electron beam lithography and 3D surface patterning [O] . Stefan Pfirrmann, Robert Kirchner, Olga Lohse, 2016

机译：MR-POSEBR：高分辨率电子束光刻和3D表面图案的新型正音抗蚀剂
8. Scanning Probe Lithography. 1. Scanning Tunneling Microscope-Induced Lithography of Self-Assembled n-Alkanethiol Monolayer Resists. [R] . Ross, C. B., Sun, L., Crooks, R. M. 1993

机译：扫描探针光刻。 1.扫描隧道显微镜诱导的自组装正烷硫醇单层抗蚀剂的光刻。

The Improved Self-assembled Monolayer of Octadecyltrichlorosilane as Positive Resist for Patterning Silicon Surface by Metastable Helium Atom Beam Lithography

著录项

引文网络

相似文献

相关主题

期刊订阅