首页> 外文OA文献 >Characteristics of DLC containing Ti and Zr films deposited by reactive magnetron sputtering

【2h】

Characteristics of DLC containing Ti and Zr films deposited by reactive magnetron sputtering

机译：反应磁控溅射沉积含DLC的Ti和Zr薄膜的DLC特性

代理获取

本网站仅为用户提供外文OA文献查询和代理获取服务，本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文，但由于OA文献来源多样且变更频繁，仍可能出现获取不到、文献不完整或与标题不符等情况，如果获取不到我们将提供退款服务。请知悉。

页面导航

著录项
引文网络
相似文献
相关主题

著录项

作者
Ma Guojia; Lin Guoqiang; Sun Gang; Zhang Huafang; Wu Hongchen;
展开▼
作者单位

展开▼
年度 2011
总页数
原文格式 PDF
正文语种
中图分类

相似文献

外文文献
中文文献
专利

1. Structure and characteristics of amorphous (Ti,Si)–C:H films deposited by reactive magnetron sputtering [J] . Jinlong Jiang, Junying Hao, Xianjuan Pang, Diamond and Related Materials . 2010,第10期

机译：反应磁控溅射沉积非晶（Ti，Si）–C：H薄膜的结构和特性
2. Study of (Zr,Ti)CN, (Zr,Hf)CN and (Zr.Nb)CN films prepared by reactive magnetron sputtering [J] . M. Braic, M. Balaceanu, A. Vladescu, Thin Solid Films . 2011,第12期

机译：反应磁控溅射制备（Zr，Ti）CN，（Zr，Hf）CN和（Zr.Nb）CN膜的研究
3. Fretting wear and fracture behaviors of Cr-doped and non-doped DLC films deposited on Ti-6al-4V alloy by unbalanced magnetron sputtering [J] . Auezhan Amanov, Tsukasa Watabe, Ryo Tsuboi, Tribology International . 2013,第Null期

机译：不平衡磁控溅射沉积在Ti-6al-4V合金上的Cr掺杂和非掺杂DLC膜的微动磨损和断裂行为
4. Effect of Sputtering Current on Structure and Morphology of (Ti_(1-x)Cr_x)N Thin Films Deposited by Reactive Unbalanced Magnetron Co-sputtering [C] . C. Paksunchai, S. Denchitcharoen, S. Chaiyakun International Science, Social Science, Engineering and Energy Conference . 2013

机译：溅射电流对（Ti_（1-x）Cr_x）N薄膜的结构和形貌的影响，反应性不平衡磁控掺杂沉积
5. Aluminium nitride piezoelectric thin films reactively deposited in closed field unbalanced magnetron sputtering for elevated temperature 'smart' tribological applications. [D] . Hasheminiasari, Masood. 2013

机译：在高温“智能”摩擦应用中，在封闭场不平衡磁控溅射中反应性沉积的氮化铝压电薄膜。
6. Structural Compositional and Plasmonic Characteristics of Ti–Zr Ternary Nitride Thin Films Tuned by the Nitrogen Flow Ratio in Magnetron Sputtering [O] . Lianlian Chen, Yujing Ran, Zhaotan Jiang, 2020

机译：通过磁控溅射中氮流量的氮气流量调节的Ti-Zr三元氮化物薄膜的结构组成和等离子体特性
7. Effect of Sputtering Current on Structure and Morphology of (Ti1-xCrx)N Thin Films Deposited by Reactive Unbalanced Magnetron Co-sputtering [O] . Paksunchai C., Denchitcharoen S., Chaiyakun S., 2012

机译：溅射电流对反应性不平衡磁控共溅射沉积（Ti1-xCrx）N薄膜结构和形貌的影响

Characteristics of DLC containing Ti and Zr films deposited by reactive magnetron sputtering

著录项

引文网络

相似文献

相关主题

期刊订阅