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Electeonic structures of group-III-nitride nanorods studied by x-ray absorption, x-ray emission, and Raman spectroscopy

机译:通过X射线吸收,X射线发射和拉曼光谱研究III族氮化物纳米棒的电子结构

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摘要

[[abstract]]Nitrogen N and metal Al, Ga, and In K-edge x-ray absorption near-edge structure XANES , x-ray emission spectroscopy XES , and Raman scattering measurements were performed to elucidate the electronic structures of group-III–nitride nanorods and thin films of AlN, GaN, and InN. XANES spectra show slight increase of the numbers of unoccupied N p states in GaN and AlN nanorods, which may be attributed to a slight increase of the degree of localization of conduction band states. The band gaps of AlN, GaN, and InN nanorods are determined by an overlay of XES and XANES spectra to be 6.2, 3.5, and 1.9 eV, respectively, which are close to those of AlN and GaN bulk/films and InN polycrystals.
机译:[[摘要]]氮和金属Al,Ga和In的K边缘x射线吸收近边缘结构XANES,x射线发射光谱XES和拉曼散射测量用于阐明III组的电子结构氮化物纳米棒和AlN,GaN和InN薄膜。 XANES光谱显示GaN和AlN纳米棒中未占据的N p状态数略有增加,这可能归因于导带态局部化程度的略微增加。通过XES和XANES光谱的重叠确定AlN,GaN和InN纳米棒的带隙分别为6.2、3.5和1.9 eV,这与AlN和GaN块/膜和InN多晶的带隙接近。

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