Rapid fabrication of 3D terahertz split ring resonator arrays by novel single-shot direct write focused proximity field nanopatterning

摘要

For the next generation of phoXonic, plasmonic, optomechanicaland microfluidic devices, the capability to create 3Dmicrostructures is highly desirable. Fabrication of such structures byconventional top-down techniques generally requires multiple timeconsumingsteps and is limited in the ability to define features spanningmultiple layers at prescribed angles. 3D direct write lithography (3DDW)has the capability to draw nearly arbitrary structures, but is an inherentlyslow serial writing process. Here we present a method, denoted focusedproximity field nanopatterning (FPnP), that combines 3DDW with single ormultiphoton interference lithography (IL). By exposing a thick photoresistlayer having a phase mask pattern imprinted on its surface with a tightlyfocused laser beam, we produce locally unique complex structures. Themorphology can be varied based on beam and mask parameters. Patternsmay be written rapidly in a single shot mode with arbitrary positionsdefined by the direct write, thus exploiting the control of 3DDW with theenhanced speed of phase mask IL. Here we show the ability for thistechnique to rapidly produce arrays of “stand-up” far IR resonators.