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Diagnostics and two-dimensional simulation of low-frequency inductively coupled plasmas with neutral gas heating and electron heat fluxes

机译:具有中性气体加热和电子热通量的低频感应耦合等离子体的诊断和二维模拟

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摘要

This article presents the results on the diagnostics and numerical modeling of low-frequency (∼460 KHz) inductively coupled plasmas generated in a cylindrical metal chamber by an external flat spiral coil. Experimental data on the electron number densities and temperatures, electron energy distribution functions, and optical emission intensities of the abundant plasma species in low/intermediate pressure argon discharges are included. The spatial profiles of the plasma density, electron temperature, and excited argon species are computed, for different rf powers and working gas pressures, using the two-dimensional fluid approach. The model allows one to achieve a reasonable agreement between the computed and experimental data. The effect of the neutral gas temperature on the plasma parameters is also investigated. It is shown that neutral gas heating (at rf powers≥0.55kW) is one of the key factors that control the electron number density and temperature. The dependence of the average rf power loss, per electron-ion pair created, on the working gas pressure shows that the electron heat flux to the walls appears to be a critical factor in the total power loss in the discharge.
机译:本文介绍了由外部扁平螺旋线圈在圆柱形金属腔中产生的低频(〜460 KHz)电感耦合等离子体的诊断和数值模拟结果。包括有关低/中压氩气放电中丰富等离子体物种的电子数密度和温度,电子能量分布函数和光发射强度的实验数据。使用二维流体方法,针对不同的射频功率和工作气体压力,计算了等离子体密度,电子温度和激发的氩物种的空间分布。该模型允许人们在计算数据和实验数据之间达成合理的共识。还研究了中性气体温度对等离子体参数的影响。结果表明,中性气体加热(射频功率≥0.55kW)是控制电子数密度和温度的关键因素之一。每个产生的电子离子对的平均rf功率损耗对工作气压的依赖性表明,进入壁的电子热通量似乎是放电中总功率损耗的关键因素。

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