首页> 外文OA文献 >Gate-level Morphogenetic Evolvable Hardware for Scalability and Adaptation on FPGAs
【2h】

Gate-level Morphogenetic Evolvable Hardware for Scalability and Adaptation on FPGAs

机译:门级形态发生性可扩展硬件,可在FPGA上实现可扩展性和适应性

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

Traditional approaches to evolvable hardware (EHW), in which the field programmable gate array (FPGA) configuration is directly encoded, have not scaled well with increasing circuit and FPGA complexity. To overcome this there have been moves towards encoding a growth process, known as morphogenesis, however existing approaches have tended to abstract away the underlying FPGA architecture.ududAlthough currently commercially available FPGAs are not the most evolution-friendly platforms, having complex architectures and issues with potentially damaging configurations, evolving circuits on commercially available devices without requiring a move to high-level building blocks is a necessary prerequisite for the adoption of EHW to solving real problems in electronic design, repair and adaptation.ududIn this paper we present a morphogenetic EHW model where growth is directed by the gate-level state of the FPGA. We demonstrate that this approach consistently outperforms a traditional EHW approach using a direct encoding, in the number of generations required to find an optimal solution, and in its ability to scale to increases in circuit size and complexity.ududIssues in EHW problem solvability are also identified, and preliminary work is presented showing that a morphogenetic approach to EHW may be well suited to correcting damaged circuits.
机译:传统的可进化硬件(EHW)的方法,其中直接对现场可编程门阵列(FPGA)配置进行编码,随着电路和FPGA复杂性的增加,扩展性一直不好。为了克服这个问题,已经朝着编码增长过程(称为形态发生)的编码迈进了一步,但是现有的方法倾向于抽象出底层的FPGA架构。以及潜在的破坏性配置问题,在不使用高级构建模块的情况下,在商用设备上发展电路是采用EHW解决电子设计,维修和改装中实际问题的必要先决条件。 ud ud我们提出了一种形态发生EHW模型,其中生长由FPGA的门级状态控制。我们证明了这种方法在寻找最佳解决方案所需的世代数量以及扩展规模以增加电路尺寸和复杂性的能力方面始终优于使用直接编码的传统EHW方法。 ud udEHW问题可解性的问题还确定了它们,并提出了初步工作,表明采用EHW的形态学方法可能非常适合校正损坏的电路。

著录项

  • 作者

    Lee Justin A.; Sitte Joaquin;

  • 作者单位
  • 年度 2006
  • 总页数
  • 原文格式 PDF
  • 正文语种 {"code":"en","name":"English","id":9}
  • 中图分类

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号