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Kelvin force microscopy characterization of charging effect in thin a-SiOxNy:H layers deposited in pulsed plasma enhanced chemical vapordeposition process by tuning the Silicon-environment

机译：开尔文力显微镜表征通过调谐硅环境在脉冲等离子体增强化学气相沉积工艺中沉积的薄a-SiOxNy：H层中的电荷效应

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International audience

机译：国际观众

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Villeneuve, Christina; Makasheva, Kremena; Bonafos, C.; Despax, B.; Boudou, Laurent; Pons, Patrick; Teyssedre, G.;
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年度 2013
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1. Kelvin force microscopy characterization of charging effect in thin a-SiOxNy:H layers deposited in pulsed plasma enhanced chemical vapor deposition process by tuning the Silicon-environment [J] . Villeneuve-Faure C., Makasheva K., Bonafos C., Journal of Applied Physics . 2013,第20期

机译：开尔文力显微镜表征通过调节硅环境在脉冲等离子体增强化学气相沉积过程中沉积的薄a-SiOxNy：H层中的电荷效应
2. Kelvin force microscopy characterization of charging effect in thin a-SiO_xN_y:H layers deposited in pulsed plasma enhanced chemical vapor deposition process by tuning the Silicon-environment [J] . C. Villeneuve-Faure, K. Makasheva, C. Bonafos, Journal of Applied Physics . 2013,第20期

机译：开尔文力显微镜表征通过调谐硅环境在脉冲等离子体增强化学气相沉积过程中沉积的薄a-SiO_xN_y：H层中的电荷效应
3. Microstructure and electrical characterizations of yttrium oxide and yttrium silicate thin films deposited by pulsed liquid-injection plasma-enhanced metal-organic chemical vapor deposition [J] . Durand C, Dubourdieu C, Vallee C, Journal of Applied Physics . 2004,第3期

机译：脉冲液体注入等离子体增强金属有机化学气相沉积法沉积氧化钇和硅酸钇薄膜的微观结构和电学性质
4. The structure of Mn_6~(III) Cr~(III)~(3+) single-molecule magnets deposited in submonolayers and monolayers on surfaces studied by means of molecular resolved atomic force microscopy (AFM) and Kelvin Probe Force Microscopy in UHV [C] . U. Heinzmann, A. Gryzia, T. Volkmann, ICPEAC . 2014

机译：Mn_6〜（III）Cr〜（III）Cr〜（III）的结构〜（3+）单分子磁体沉积在通过分子分辨的原子力显微镜（AFM）和UHV中的Kelvin探针力显微镜（AFM）和Kelvin探针力显微镜研究的表面上的单层磁体
5. Characterization of the insulating layer of magnetic tunnel junctions and investigations on bulk ilmenite-hematite and pulsed laser deposited ilmenite-hematite thin films. [D] . Allen, Drew Morgan. 2003

机译：磁性隧道结绝缘层的表征以及块状钛铁矿-赤铁矿和脉冲激光沉积钛铁矿-赤铁矿薄膜的研究。
6. Crystallographic order and decomposition of MnIII6CrIII3+ single-molecule magnets deposited in submonolayers and monolayers on HOPG studied by means of molecular resolved atomic force microscopy (AFM) and Kelvin probe force microscopy in UHV [O] . Aaron Gryzia, Timm Volkmann, Armin Brechling, 2014

机译：分子分辨原子力显微镜（AFM）和开尔文探针力显微镜研究了HOPG上亚单层和单层中MnIII6CrIII 3+单分子磁体的结晶顺序和分解
7. Kelvin force microscopy characterization of charging effect in thin a-SiOxNy:H layers deposited in pulsed plasma enhanced chemical vapordeposition process by tuning the Silicon-environment [O] . Villeneuve, Christina, Makasheva, Kremena, Bonafos, C., 2013

机译：开尔文力显微镜表征通过调谐硅环境在脉冲等离子体增强化学气相沉积过程中沉积的薄a-SiOxNy：H层中的电荷效应

Kelvin force microscopy characterization of charging effect in thin a-SiOxNy:H layers deposited in pulsed plasma enhanced chemical vapordeposition process by tuning the Silicon-environment

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