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Some preparations and properties of high oxidation state transition-metal fluorides and chalcogenide fluorides.

机译:高氧化态过渡金属氟化物和硫族化物氟化物的一些制备和性能。

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摘要

The work presented in this thesis is divided into two parts. In the first the preparation, characterisation, physical properties and chemistry of the noble was fluoride MrF2 are reviewed. In the present work the oxidizing power of MrF2 is investigated in its reaction with transition metals chromium and osmium and in its reaction with MoF3 at room temperature in HF. CrF5 and CsP5 are the highest oxidation state metal fluorides produced. The compounds were identified by infrared and 19F NMR spectroscopy and, in the case of CrF5, mass spectrometry. EJR spectroscopy has revealed the structure of CrF5 in solution. At -60C CrF5 is present as a fluorine bridged pentamer. The reaction of KrF2 with MnF3 appears to result in oxidation but no clear evidence has been obtained for anything other than starting material. In the second part of the thesis present advances in the preparation of transition metal chalcogenide fluorides are reviewed. The present work investigates the reaction of WF6 with Sb2Te3, MoF6 with Sb2X3 (X = S, Se, Te), MF5 (M = Ta, Nb) with Sb2S3, TaF5 with Sb2Se3, ReF6 with Sb2X3 (X = S, Se) and UF6 with Sb2S3. New compounds MoSF4, MoSeF4, ReSF4 and ReSeF4 have been prepared and characterized. All these compounds appear to exist as fluorine bridged polymers are highly sensitive to air and moisture decomposing to give HF and H2S or H2Se. No clear results were obtained to enable new compounds prepared by reaction of MF5 (M = Ta, Nb) with Sb2S3 results in the reduction of the hexafluoride to a mixture of UF5 and UF4 or to U2F9 depending on the reaction conditions.
机译:本文的工作分为两个部分。首先回顾了氟化物MrF2的制备,表征,物理性质和化学性质。在目前的工作中,研究了MrF2在与HF,过渡金属铬和的反应以及在室温下与MoF3的反应中的氧化能力。 CrF5和CsP5是产生的氧化态最高的金属氟化物。通过红外和19F NMR光谱对化合物进行鉴定,对于CrF5,则通过质谱进行鉴定。 EJR光谱揭示了溶液中CrF5的结构。在-60°C时,CrF5作为氟桥五聚体存在。 KrF2与MnF3的反应似乎导致氧化,但除起始原料外,未获得任何明确的证据。在论文的第二部分中,综述了过渡金属硫族化物氟化物的制备进展。本工作研究了WF6与Sb2Te3,MoF6与Sb2X3(X = S,Se,Te),MF5(M = Ta,Nb)与Sb2S3,TaF5与Sb2Se3,ReF6与Sb2X3(X = S,Se)和UF6与Sb2S3。已经制备并表征了新化合物MoSF4,MoSeF4,ReSF4和ReSeF4。所有这些化合物似乎都存在,因为氟桥聚合物对空气和湿气高度敏感,分解后会生成HF和H2S或H2Se。无法获得明确的结果,无法通过MF5(M = Ta,Nb)与Sb2S3反应制备的新化合物导致六氟化物还原为UF5和UF4的混合物或还原为U2F9,具体取决于反应条件。

著录项

  • 作者

    Puddick, David Charles.;

  • 作者单位
  • 年度 1982
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  • 原文格式 PDF
  • 正文语种 {"code":"en","name":"English","id":9}
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