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Computer simulation of the sheath and the adjacent plasma in the presence of a plasma source

机译:在存在等离子体源的情况下对鞘管和相邻等离子体的计算机模拟

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摘要

A model is constructed allowing computer simulations of the near-wall area of a planar plasma sheet in conditions where the steady state of the plasma is supported by the production of charged particles in a region removed from the wall. Calculations have revealed variation in the energy distribution of the electrons in both time and spatially over the sheet width (cooling the electronic component) due to absorption of fast electrons at the walls bounding the plasma volume. It is shown that the plasma density profile across the sheet width has an abrupt decrease at the boundary of the region of plasma regulation. Thus the standard concepts of the potential and plasma density distributions in the sheath and presheath based on the assumption of a stable energy distribution for the electrons in the presheath yields inaccurate results for the plasma sheet where the ionization source is remote from the wall.
机译:构造一个模型,该模型允许在等离子体的稳态由在从壁中移出的区域中产生带电粒子的情况下支持的情况下,对平面等离子体片的近壁区域进行计算机模拟。计算表明,由于在限制等离子体体积的壁上吸收了快电子,电子在整个薄片宽度上的时间和空间上的电子能量分布都会发生变化(冷却电子组件)。结果表明,整个板宽上的等离子体密度分布在等离子体调节区域的边界处突然减小。因此,基于对鞘中的电子的稳定能量分布的假设,鞘和鞘中的电势和等离子体密度分布的标准概念对于电离源远离壁的等离子体片产生不准确的结果。

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