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A method of normalizing cathodoluminescence images of electron transparent foils for thickness contrast applied to InGaN quantum wells

机译:一种用于InGaN量子阱的归一化电子透明箔的阴极发光图像以进行厚度对比的方法

摘要

The uniformity of panchromatic cathodoluminescence (CL) from In0.09Ga0.91N/GaN quantum wells at 100 K was investigated using a combined transmission electron microscope-cathodoluminescence instrument. A technique for correcting CL images of electron-transparent wedge specimens for thickness contrast artefacts is presented. The foil thickness was estimated using the dynamical formulation of the relationship between the thickness and the (experimentally observed) transmitted electron intensity. For a given thickness the CL intensity was calculated using the Everhart-Hoff depth-dose function and also taking into account surface recombination losses. Experimental CL images were normalized by dividing by the calculated CL value at each point. The procedure was successful in calculating the underlying materials contrast in CL images of thin specimens of InGaN single quantum wells. Non-uniformities in the CL emission on the scale of similar to0.7 mum were observed.
机译:使用组合式透射电子显微镜-阴极发光仪研究了In0.09Ga0.91N / GaN量子阱在100 K下的全色阴极发光(CL)的均匀性。提出了一种校正电子透明楔形样品的CL图像以形成厚度对比伪影的技术。使用厚度与(实验观察到的)透射电子强度之间关系的动态公式估算箔的厚度。对于给定的厚度,CL强度是使用Everhart-Hoff深度剂量函数计算的,还考虑了表面重组损失。实验CL图像通过除以每个点的计算CL值进行归一化。该程序成功地计算了InGaN单量子阱薄样品的CL图像中的基础材料对比度。观察到CL发射的不均匀程度接近0.7微米。

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