Electron conduction in CF4 under a simplified model quadrupole magnetic field (QMF) and rf electric fields at f ¼ 13:56, 27.12, and 40.68MHz wasanalyzed using a Monte Carlo method, following the manner of electron swarm analyses. This field configuration simulated current paths ofmagnetic neutral loop discharge plasmas used for dry etching. The electron conduction therein was focused on as an elemental process of plasmapower deposition. The electrons formed a star-shaped distribution with four rays along the separatrices of the QMF. The effective electronconductivity quantified as the amplitude of mean electron velocity was high around the central axis. The time-averaged mean electron velocities inthe four regions of the QMF were biased under a rectification effect of the magnetic field. With increasing f , the high-conductivity region expandedand ionization was promoted. An enhancement of plasma power deposition under high driving frequencies was indicated.
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