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Surface Roughness and Magnetic Properties of Ni and Ni78Fe22 Thin Films on Polyethylene Naphthalate Organic Substrates

机译:聚萘二甲酸乙二醇酯有机基底上Ni和Ni78Fe22薄膜的表面粗糙度和磁性

摘要

We have studied structural, electrical, and magnetic properties of Ni and Ni78Fe22 thin films evaporated on polyethylene naphtalate (PEN) organic substrates towards the fabrication of spin quantum cross (SQC) devices. As we have investigated the scaling properties on the surface roughness, the surface roughness of Ni (16 nm)/PEN is 0.34 nm, corresponding to 2 or 3 atomic layers, in the scanning scale of 16 nm, and the surface roughness of Ni78Fe22 (14 nm)/PEN is also as small as 0.25 nm, corresponding to less than 2 atomic layers, in the scanning scale of 14 nm. These facts denote that Ni/PEN and Ni78Fe22/PEN are suitable for magnetic electrodes on organic substrates used for SQC devices from the viewpoint of the surface morphology. Then, we have investigated magnetic hysteresis curve and magnetoresistance effects for Ni/PEN and Ni78Fe22/PEN. The squareness of the hysteresis loop is as small as 0.24 for Ni (25 nm)/PEN, where there is no observation of the anisotropy magnetoresistance (AMR) effect. In contrast, the squareness of the hysteresis loop is as large as 0.86 for Ni78Fe22 (26 nm)/PEN, where the AMR effect has been successfully obtained. These experimental results indicate that Ni78Fe22/PEN is a promising material for use in SQC devices from the viewpoint of not only the surface morphologies but also magnetic properties.
机译:我们已经研究了在自旋量子交叉(SQC)器件的制造过程中在聚萘二甲酸乙二醇酯(PEN)有机衬底上蒸发的Ni和Ni78Fe22薄膜的结构,电学和磁性。我们已经研究了表面粗糙度的标度特性,Ni(16 nm)/ PEN的表面粗糙度为0.34 nm,在16 nm的扫描范围内对应于2或3个原子层,而Ni78Fe22( 14 nm)/ PEN在14 nm的扫描范围内也小至0.25 nm,相当于少于2个原子层。这些事实表明,从表面形态的观点来看,Ni / PEN和Ni78Fe22 / PEN适合用于SQC器件的有机基板上的磁性电极。然后,我们研究了Ni / PEN和Ni78Fe22 / PEN的磁滞曲线和磁阻效应。对于Ni(25 nm)/ PEN,磁滞回线的矩形度小至0.24,而没有观察到各向异性磁阻(AMR)效应。相反,对于Ni78Fe22(26 nm)/ PEN,磁滞回线的矩形度高达0.86,其中已成功获得AMR效果。这些实验结果表明,不仅从表面形态而且从磁性能的角度来看,Ni78Fe22 / PEN是用于SQC器件的有前途的材料。

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