Integrated optical and millimetric circuits produced by standard thin film-based technology suffer from manufacturing imperfections resulting in degradation of the absorption/diffraction response. Deposition through rf-bias sputtering is of particular interest in order to design an optical multilayered (Si and SiO2) filter. Geometrical imperfections like roughness at layer boundaries however gradually increase with the number of deposited layers. The low-pass filter specifications present high sensitivity to the errors of the exact values of ideal thickness and of ideal refractive indices. In this contribution, we evaluate the sensitivity of the specifications with respect to deviation from the exact values of refractive indices and thicknesses.
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