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High resolution studies of low-energy electron attachment to SF5Cl: Product anions and absolute cross sections

机译:低能电子与SF5Cl附着的高分辨率研究:产物阴离子和绝对截面

摘要

Low energy electron attachment to SF(_5)Cl was studied at high energy resolution by mass spectrometric detection of the product anions. Two variants of the laser photoelectron attachment (LPA) technique (Kaiserslautern) were used for determining the threshold behaviour of the yield for SF(_5^-) formation at about 1 meV resolution, and to investigate the relative cross sections for Cl(^-), FCl(^-), and SF(_5^-) formation towards higher energies (up to 1 eV) at about 20 meV resolution. Thermal swarm measurements (Birmingham) were used to place the relative LPA cross sections on an absolute scale. A trochoidal electron monochromator (Innsbruck) was used for survey measurements of the relative cross sections for the different product anions over the energy range of 0-14 eV with a resolution of 0.30 eV. Combined with earlier beam data (taken at Berlin, J. Chem. Phys. 88 (1988) 149), the present experimental results provide a detailed set of partial cross sections for anion formation in low-energy electron collisions with SF(_5)Cl.
机译:通过质谱检测产物阴离子,以高能分辨率研究了低能电子对SF (_ 5 )Cl的附着。激光光电子附着(LPA)技术的两个变体(Kaiserslautern)用于确定在大约1 meV分辨率下SF (_ 5 ^-)形成的产率的阈值行为,并研究Cl 的相对截面(^-),FC1 (^-)和SF (_ 5 ^-)在大约20 meV的分辨率下向更高的能量(最高1 eV)形成。使用热群测量(伯明翰)以绝对比例放置相对LPA横截面。摆线电子单色仪(Innsbruck)用于在0-14 eV能量范围内以0.30 eV的分辨率测量不同产物阴离子的相对截面的测量结果。结合较早的电子束数据(在Berlin,J. Chem。Phys。88(1988)149上获得),本实验结果提供了一组详细的局部截面图,用于在低能电子与SF (_ 5 Cl。

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