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Identifying vacancy complexes in compound semiconductors with positron annihilation spectroscopy: A case study of InN

机译:正电子an没光谱法识别化合物半导体中的空位络合物:以InN为例

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摘要

We present a comprehensive study of vacancy and vacancy-impurity complexes in InN combining positron annihilation spectroscopy and ab initio calculations. Positron densities and annihilation characteristics of common vacancy-type defects are calculated using density functional theory, and the feasibility of their experimental detection and distinction with positron annihilation methods is discussed. The computational results are compared to positron lifetime and conventional as well as coincidence Doppler broadening measurements of several representative InN samples. The particular dominant vacancy-type positron traps are identified and their characteristic positron lifetimes, Doppler ratio curves, and line-shape parameters determined. We find that indium vacancies (VIn) and their complexes with nitrogen vacancies (VN) or impurities act as efficient positron traps, inducing distinct changes in the annihilation parameters compared to the InN lattice. Neutral or positively charged VN and pure VN complexes, on the other hand, do not trap positrons. The predominantly introduced positron trap in irradiated InN is identified as the isolated VIn, while in as-grown InN layers VIn do not occur isolated but complexed with one or more VN. The number of VN per VIn in these complexes is found to increase from the near-surface region toward the layer-substrate interface.
机译:我们结合正电子an没光谱和从头算计算,对InN中的空位和空位-杂质配合物进行了全面的研究。利用密度泛函理论计算了常用空位型缺陷的正电子密度和an灭特性,讨论了用正电子an没方法进行实验检测和区分的可行性。将计算结果与几个代表性的InN样品的正电子寿命和常规以及巧合多普勒展宽测量值进行比较。确定特定的主要空位型正电子陷阱,并确定其特征性正电子寿命,多普勒比率曲线和线形参数。我们发现铟空位(VIn)及其与氮空位(VN)或杂质的络合物可作为有效的正电子陷阱,与InN晶格相比,会导致an没参数发生明显变化。另一方面,中性或带正电的VN和纯VN络合物不会俘获正电子。在辐照的InN中主要引入的正电子陷阱被识别为孤立的VIn,而在成长期的InN层中,VIn不会孤立地出现,而是与一个或多个VN络合。发现这些复合物中每个VIn的VN数目从近表面区域向层-基底界面增加。

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