首页> 外文OA文献 >Exceptional surface and bulk electronic structures in a topological insulator, Bi2Se3
【2h】

Exceptional surface and bulk electronic structures in a topological insulator, Bi2Se3

机译:拓扑绝缘体Bi2Se3中出色的表面和整体电子结构

代理获取
本网站仅为用户提供外文OA文献查询和代理获取服务,本网站没有原文。下单后我们将采用程序或人工为您竭诚获取高质量的原文,但由于OA文献来源多样且变更频繁,仍可能出现获取不到、文献不完整或与标题不符等情况,如果获取不到我们将提供退款服务。请知悉。

摘要

The outstanding problem in topological insulators is the bulk metallicity underneath topologically ordered surface states and the appearance of Dirac point far away from the Fermi energy. Enormous efforts are being devoted to get the Dirac point at the Fermi level via exposure to foreign materials so that these materials can be used in technology and realize novel fundamental physics. Ironically, the conclusion of bulk metallicity in the electronic structure is essentially based on the angle resolved photoemission spectroscopy, a highly surface sensitive technique. Here, we employed state of-the-art hard x-ray photoemission spectroscopy with judiciously chosen experiment geometry to delineate the bulk electronic structure of a topological insulator and a potential thermoelectric material, Bi2Se3. Theudresults exhibit signature of insulating bulk electronic structure with tiny intensities at ef akin to defect/vacancy induced doped states in the semiconductors. The core level spectra exhibit intense plasmon peak associated to core level excitations manifesting the signature of coupling of electrons to the collective excitations, a possible case of plasmon-phonon coupling. In addition, a new loss feature appear in the core level spectra indicating presence of additional collective excitations in the system.
机译:拓扑绝缘体中的突出问题是拓扑有序表面状态下的整体金属性以及狄拉克点的出现远离费米能量。人们正竭尽全力通过暴露于外来物质使狄拉克点达到费米水平,以便这些物质可用于技术中并实现新颖的基础物理学。具有讽刺意味的是,电子结构中整体金属性的结论基本上基于角度分辨光发射光谱法,这是一种高度表面敏感的技术。在这里,我们采用了最先进的硬X射线光发射光谱技术,并精心选择了实验几何形状,以描绘拓扑绝缘体和潜在的热电材料Bi2Se3的体电子结构。结果显示出具有类似于半导体中的缺陷/空位引起的掺杂态的微小强度的绝缘体电子结构的特征。核心能级谱显示出与核心能级激发相关的强烈等离激元峰,表明电子耦合到集体激发的签名,这是等离激元-声子耦合的可能情况。另外,新的损耗特征出现在核心能级谱中,表明系统中存在其他集体激励。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
代理获取

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号