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Thermal stability of reactive sputtered tungsten oxide coatings

机译:反应溅射氧化钨涂层的热稳定性

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摘要

The thermal stability of different W-O coatings, W100, W90O10, W54O46, W30O70 and W25O75, were studied by in-situ X-ray diffraction at elevated temperatures up to 900 °C. The coatings were deposited by DC reactive magnetron sputtering from a pure tungsten target in an Ar + O2 atmosphere onto Fecralloy alloy. The evolution of the structure of the coatings was studied in both protective and oxidant atmospheres. Three groups of films were identified: (1) W25O75 which showed structural evolution following the W-O phase diagram; (2) amorphous O-deficient WO3 whose structure followed the W-O phase diagram either as WO3 or as its chemical composition depending on annealing in oxidant or protective atmospheres, respectively; and (3) low O-content crystalline films that oxidized from 500 °C.
机译:通过在最高900°C的高温下进行原位X射线衍射研究了W100,W90O10,W54O46,W30O70和W25O75不同W-O涂层的热稳定性。通过直流反应磁控溅射将涂层从纯钨靶材在Ar + O2气氛中沉积到Fecralloy合金上。在保护性气氛和氧化剂气氛中研究了涂层结构的演变。确定了三组膜:(1)W25O75,其遵循W-O相图显示结构演变; (2)无定形O-缺乏的WO3,其结构遵循W-O相图,其结构分别为WO3或其化学组成,这取决于在氧化剂或保护性气氛中的退火; (3)从500°C开始氧化的低O含量结晶膜。

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